Machine Learning-Driven Quantum Sequencing of Natural and Chemically Modified DNA

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-03-29 DOI:10.1021/acsami.4c22809
Dipti Maurya, Sneha Mittal, Milan Kumar Jena, Biswarup Pathak
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Abstract

Simultaneous identification of natural and chemically modified DNA nucleotides at molecular resolution remains a pivotal challenge in genomic science. Despite significant advances in current sequencing technologies, the ability to identify subtle changes in natural and chemically modified nucleotides is hindered by structural and configurational complexity. Given the critical role of nucleobase modifications in data storage and personalized medicine, we propose a computational approach using a graphene nanopore coupled with machine learning (ML) to simultaneously recognize both natural and chemically modified nucleotides, exploring a wide range of modifications in the nucleobase, sugar, and phosphate moieties while investigating quantum transport mechanisms to uncover distinct molecular signatures and detailed electronic and orbital insights of the nucleotides. Integrating with the best-fitted model, the graphene nanopore achieves a good classification accuracy of up to 96% for each natural, chemically modified, purine, and pyrimidine nucleotide. Our approach offers a rapid and precise solution for real-time DNA sequencing by decoding natural and chemically modified nucleotides on a single platform.

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自然和化学修饰DNA的机器学习驱动量子测序
在分子分辨率上同时鉴定天然和化学修饰的DNA核苷酸仍然是基因组科学的关键挑战。尽管当前测序技术取得了重大进展,但识别天然和化学修饰核苷酸的细微变化的能力受到结构和构型复杂性的阻碍。鉴于核碱基修饰在数据存储和个性化医疗中的关键作用,我们提出了一种使用石墨烯纳米孔结合机器学习(ML)的计算方法,同时识别天然和化学修饰的核苷酸,探索核碱基、糖、磷酸盐部分,同时研究量子传输机制,以揭示核苷酸的独特分子特征和详细的电子和轨道见解。与最佳拟合模型相结合,石墨烯纳米孔对每种天然、化学修饰、嘌呤和嘧啶核苷酸的分类准确率高达96%。我们的方法通过在单一平台上解码天然和化学修饰的核苷酸,为实时DNA测序提供了快速和精确的解决方案。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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