N-doped BC/Ferrite collaborative degradation of antibiotics: Synthesis and mechanism research

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-04-02 DOI:10.1016/j.mssp.2025.109527
Wenlu Wang, Xin Ke
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Abstract

The emergence of antibiotics, a new type of toxic organic pollutant, poses a pollution threat to water resources closely related to our health and living environment. An increasing number of scholars are investigating the removal of antibiotics from aquatic systems, which represent emerging contaminants of concern due to their widespread detection and persistence in water bodies. They have proposed an effective method for the synergistic treatment of antibiotics in water through adsorption and photocatalytic degradation. Among these materials, biochar demonstrates remarkable adsorption capacity during pollutant adsorption, attributable to its extensive specific surface area and profusion of surface functional groups. Ferrite semiconductors have been widely utilized for photocatalysts owing to their unique electronic properties and magnetic recoverability, enabling efficient degradation of organic pollutants under light irradiation. The synergistic interaction between biochar and ferrite substantially improves adsorption capacity and photocatalytic efficiency, offering a dual-functional mechanism for antibiotic pollutant remediation. Consequently, many scholars are dedicating themselves to the study of removing antibiotic pollutants in water via nitrogen-doped biochar and ferrite composites. This review examines N-doped biochar and ferrite composites from four perspectives: material preparation, material synthesis, principles of adsorption and photocatalysis, and future research directions. The latest research findings are summarized to advance the development of nitrogen-doped biochar and ferrite composites as effective adsorbents and photocatalysis for removing antibiotics from water.

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n掺杂BC/铁氧体协同降解抗生素的合成及机理研究
抗生素作为一种新型有毒有机污染物的出现,对与人类健康和生活环境密切相关的水资源造成了污染威胁。越来越多的学者正在研究从水生系统中去除抗生素,这是由于它们在水体中广泛存在和持续存在而引起关注的新兴污染物。他们提出了一种通过吸附和光催化降解协同处理水中抗生素的有效方法。在这些材料中,生物炭由于其广泛的比表面积和丰富的表面官能团,在污染物吸附过程中表现出显著的吸附能力。铁氧体半导体由于其独特的电子性质和磁可恢复性,在光照射下能够有效地降解有机污染物,已被广泛应用于光催化剂。生物炭与铁酸盐之间的协同作用大大提高了吸附能力和光催化效率,为抗生素污染物的修复提供了双重功能机制。因此,许多学者致力于通过掺氮生物炭和铁氧体复合材料去除水中抗生素污染物的研究。本文从材料制备、材料合成、吸附与光催化原理以及未来研究方向四个方面对氮掺杂生物炭与铁氧体复合材料进行了综述。本文综述了氮掺杂生物炭与铁氧体复合材料的最新研究成果,以期促进氮掺杂生物炭与铁氧体复合材料作为有效的吸附剂和光催化去除水中抗生素的发展。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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