Cadmium selenide/lead sulfide quantum dot film for high performance and broadband photodetectors

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-04-02 DOI:10.1016/j.mssp.2025.109517
Xiaolu Wang, Xuanyue Huang, Xuemin Gong, Rong Mo, Hongxing Li, Kai Huang
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Abstract

Cadmium selenide (CdSe) possesses unique physical and chemical properties, and its high light absorption and high carrier mobility give it significant research prospects in the field of optoelectronic applications. However, the limitations of its energy band structure make it difficult to achieve high performance and broadband photodetection applications. Here, we report a hybrid photodetector prepared by spin-coating PbS quantum dots on CdSe nanocrystalline film that exhibits excellent optoelectronic properties. The prepared CdSe/PbS QD photodetector has a broad photoresponse from visible (450 nm) to near-infrared (1050 nm). Under the light irradiation at 660 nm (incident light power 27.8 μW/cm2) with bias voltage 2.0 V, the responsivity reaches 58.6 A/W, and the specific detectivity reaches up to 1.02 × 1012 Jones. In addition, the photodetector has a fast response time, with a rise time of 0.44 ms and a fall time of 0.553 ms. The CdSe/PbS QD photodetector offers promising prospects for applications in broadband photodetection and imaging sensor in the future.
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用于高性能和宽带光电探测器的硒化镉/硫化铅量子点薄膜
硒化镉(CdSe)具有独特的物理和化学特性,它的高光吸收率和高载流子迁移率使其在光电应用领域具有重要的研究前景。然而,由于其能带结构的限制,很难实现高性能和宽带光探测应用。在此,我们报告了一种通过在镉硒纳米晶薄膜上旋涂 PbS 量子点制备的混合光电探测器,该探测器具有优异的光电特性。所制备的 CdSe/PbS QD 光电探测器具有从可见光(450 纳米)到近红外(1050 纳米)的宽光响应。在偏置电压为 2.0 V、波长为 660 nm(入射光功率为 27.8 μW/cm2)的光照射下,其响应率达到 58.6 A/W,比检测率高达 1.02 × 1012 Jones。此外,该光电探测器响应速度快,上升时间为 0.44 毫秒,下降时间为 0.553 毫秒。CdSe/PbS QD 光电探测器在未来宽带光电探测和成像传感器领域的应用前景十分广阔。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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