Unravelling the potential of non-reactively sputtered (Ti,Al)N coatings

IF 6.1 2区材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS Surface & Coatings Technology Pub Date : 2025-03-31 DOI:10.1016/j.surfcoat.2025.132093

Balint Istvan Hajas , Sarah Christine Bermanschläger , Alexander Kirnbauer , Tomasz Wojcik , Szilard Kolozsvári , Paul Heinz Mayrhofer

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Abstract

Non-reactive magnetron sputtering was used to synthesize (Ti,Al)N coatings from a TiN/AlN (50 % AlN) composite target, with a detailed investigation into how process parameters influence phase formation, hardness, and thermal stability. Optimizing pulse parameters, such as increasing reverse pulse on-time (t_on-r) to 8016 ns or pulse frequency (f_p) to 250 kHz, effectively suppressed the hcp phase observed under reference conditions (f_p = 50 kHz, t_on-r = 496 ns, substrate temperatures T_s = 600 °C, sputter power density P_t = 8.6 W/cm², substrate bias U_b = −50 V). Lower T_s (≤ 450 °C) or P_t (3.4 W/cm²) also mitigate hcp phase formation, while higher T_s or P_t (up to 18.6 W/cm²) amplified it.

Similarly, increasing U_b to −100 V allows to prepare single-phase fcc structured (Ti,Al)N with H up to 39.8 ± 2.1 GPa. By adding 5–10 % N₂ to the Ar working gas, the hcp phase formation can be avoided, achieving coatings with H = 38.3 ± 1.4 GPa.

Detailed in-situ XRD as well as TEM studies reveal that coatings with a single-phase fcc structure provide a superior thermal stability during vacuum annealing treatments, particularly those deposited with U_b = −100 V. These retain their fcc structure up to 1100 °C and reach 44.7 ± 2.3 GPa through age hardening.

This study underscores the critical role of suppressing hcp phase formation to enhance both hardness and thermal stability. Optimizing deposition parameters enables the tailoring of (Ti,Al)N coatings for demanding high-temperature applications.

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揭示非反应溅射（Ti,Al）N涂层的潜力

采用非反应磁控溅射法制备了TiN/AlN （50% AlN）复合靶材的（Ti,Al）N涂层，并详细研究了工艺参数对相形成、硬度和热稳定性的影响。优化脉冲参数,例如增加反向脉冲准时(ton-r)到8016 ns或脉冲频率(fp) 250 kHz,有效地抑制了hcp相观察参考条件下(fp = 50 kHz, ton-r = 496 ns,衬底温度t = 600°C,溅射功率密度Pt = 8.6 W / cm2,衬底偏置乌兰巴托=−50 V)。降低Ts(≤450°C)或Pt (3.4 W / cm2)也减轻hcp相的形成,而更高的Ts或Pt (18.6 W / cm2)放大它。同样，将Ub增加到−100 V，可以制备出H高达39.8±2.1 GPa的单相fcc结构（Ti,Al）N。在Ar工作气体中加入5 ~ 10%的N2，可以避免hcp相的形成，获得H = 38.3±1.4 GPa的镀层。详细的原位XRD和TEM研究表明，单相fcc结构的涂层在真空退火处理中具有优异的热稳定性，特别是在Ub = - 100 V下沉积的涂层。在1100℃温度下保持fcc结构，时效硬化达到44.7±2.3 GPa。这项研究强调了抑制hcp相形成对提高硬度和热稳定性的关键作用。优化沉积参数可以定制（Ti,Al）N涂层，以满足苛刻的高温应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Surface & Coatings Technology 工程技术-材料科学：膜

CiteScore

10.00

自引率

11.10%

发文量

921

审稿时长

19 days

期刊介绍： Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.