CrRu-X (X=VN, TiN, ZrN) seed layers effects on the epitaxial growth and magnetic properties of FePt-based films

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2025-04-07 DOI:10.1016/j.tsf.2025.140672
Jai-Lin Tsai , Tsung-Yi Chen , Ming-Wei Hsieh , Cheng-Yu Tsai , Mau-Tin Lin , Hsin-Hau Huang
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Abstract

For heat-assisted magnetic recording media, each functional film, such as the underlayer/seed layer/heat-sink layer deposited on the amorphous soft magnetic underlayer/glass substrate, was required to grow epitaxially to promote the formation of (00L) textured FePt film. The Cr-based seed layer with (002)/[110] epitaxial orientation is essential for the growth of the MgO-based underlayer and the FePt perpendicular magnetic recording film. Here, the varied nitrides, VN, TiN, or ZrN, were further doped in the CrRu seed layer to modify the interface between the CrRu and MgTiON layer. For CrRu-X (X= TiN, ZrN) films, the Ti and Zr atoms were substituted in the CrRu lattice, which is evidenced in the lower diffraction angle (higher lattice constant) in the (002) plane, and the growth defects in the MgTiON layer can be improved due to smaller lattice misfit. In contrast, the lattice constant of CrRu-VN was close to the reference CrRu film because part of the VN was diffused up to the MgTiON layer and formed the bumpy morphology of grains, proved by the cross-sectional transition electron microscopy images and compositional analysis—the grain size and surface energy change when the VN presents around the MgTiON matric. The FePt (BN, Ag, C) film deposited on MgTiON/CrRu-VN shows the highest perpendicular magnetic anisotropy constant (Ku) with the value of 2.36 × 106 J/m3, out of plane coercivity (Hc= 2013 kA/m) and lowest remanence ratio (0.187) which is the ratio between in-plane remanence and out-of-plane remanence from hysteresis loops. The nitride-doped CrRu-X seed layer affected the magnetic and microstructural of FePt (BN, Ag, C) film via diffused VN in the MgTiON lattice or minor lattice strain during thin film growth in MgTiON/CrRu-X (X= TiN, ZrN) system.
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CrRu-X (X=VN, TiN, ZrN)种子层对fept基薄膜外延生长和磁性能的影响
对于热辅助磁记录介质,每一种功能薄膜,如沉积在非晶软磁底层/玻璃基板上的底层/种子层/热沉层,都需要外延生长,以促进(00L)织构FePt薄膜的形成。具有(002)/[110]外延取向的cr基种子层对于mgo基底层和FePt垂直磁记录膜的生长至关重要。在CrRu种子层中进一步掺杂不同的氮化物VN、TiN或ZrN,以改变CrRu和MgTiON层之间的界面。对于CrRu-X (X= TiN, ZrN)薄膜,Ti和Zr原子在CrRu晶格中被取代,这体现在(002)平面上较低的衍射角(较高的晶格常数)上,并且由于较小的晶格错配可以改善MgTiON层中的生长缺陷。而CrRu-VN的晶格常数接近于参考CrRu膜,这是因为部分VN向MgTiON层扩散,形成了凹凸不平的晶粒形态,这一点通过截面跃迁电镜图像和成分分析得到了证明——当VN在MgTiON基体周围存在时,晶粒尺寸和表面能发生了变化。在MgTiON/CrRu-VN上沉积的FePt (BN, Ag, C)薄膜显示出最高的垂直磁各向异性常数(Ku),为2.36 × 106 J/m3,面外矫顽力(Hc= 2013 kA/m)和最低的剩余率(0.187),即面内剩余量与面外剩余量之比。在MgTiON/CrRu-X (X= TiN, ZrN)体系中,氮掺杂CrRu-X种子层通过MgTiON晶格中的扩散VN或较小晶格应变影响FePt (BN, Ag, C)薄膜的磁性和微观结构。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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