Optimizing Pulse Conditions for Enhanced Memory Performance of Se-Based Selector-Only Memory

IF 2.4 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Journal of the Electron Devices Society Pub Date : 2025-04-03 DOI:10.1109/JEDS.2025.3557732
Jangseop Lee;Taras Ravsher;Daniele Garbin;Sergiu Clima;Robin Degraeve;Attilio Belmonte;Hyunsang Hwang;Inhee Lee
{"title":"Optimizing Pulse Conditions for Enhanced Memory Performance of Se-Based Selector-Only Memory","authors":"Jangseop Lee;Taras Ravsher;Daniele Garbin;Sergiu Clima;Robin Degraeve;Attilio Belmonte;Hyunsang Hwang;Inhee Lee","doi":"10.1109/JEDS.2025.3557732","DOIUrl":null,"url":null,"abstract":"In this study, we investigated the effect of pulse falling time (Tfall) on the electrical characteristics of SiGeAsSe-based selector-only memory (SOM) devices. Our experimental results demonstrate that increasing the <inline-formula> <tex-math>$\\mathrm { T_{fall}}$ </tex-math></inline-formula> leads to an increased threshold voltage (Vth) and reduced <inline-formula> <tex-math>$\\mathrm { V_{th}}$ </tex-math></inline-formula> drift in SiGeAsSe devices. The optimized devices exhibit a remarkable memory window (> 1 V) and significantly suppressed drift characteristics (~10 mV/dec.). Electrical measurements at high temperatures demonstrate that <inline-formula> <tex-math>$\\mathrm { T_{fall}}$ </tex-math></inline-formula> is one of the important factors in material relaxation, and these improvements are attributed to the intentionally induced reconfiguration of the chalcogenide film. Furthermore, our results reveal that a suitable <inline-formula> <tex-math>$\\mathrm { T_{fall}}$ </tex-math></inline-formula> can effectively mitigate the degradation of the memory window at high temperatures. These findings afford valuable insights into the role of material relaxation in SOM devices, potentially aiding the development of high-performance memory devices.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":"13 ","pages":"362-365"},"PeriodicalIF":2.4000,"publicationDate":"2025-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10949046","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10949046/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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Abstract

In this study, we investigated the effect of pulse falling time (Tfall) on the electrical characteristics of SiGeAsSe-based selector-only memory (SOM) devices. Our experimental results demonstrate that increasing the $\mathrm { T_{fall}}$ leads to an increased threshold voltage (Vth) and reduced $\mathrm { V_{th}}$ drift in SiGeAsSe devices. The optimized devices exhibit a remarkable memory window (> 1 V) and significantly suppressed drift characteristics (~10 mV/dec.). Electrical measurements at high temperatures demonstrate that $\mathrm { T_{fall}}$ is one of the important factors in material relaxation, and these improvements are attributed to the intentionally induced reconfiguration of the chalcogenide film. Furthermore, our results reveal that a suitable $\mathrm { T_{fall}}$ can effectively mitigate the degradation of the memory window at high temperatures. These findings afford valuable insights into the role of material relaxation in SOM devices, potentially aiding the development of high-performance memory devices.
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优化脉冲条件以增强基于se的纯选择器存储器的内存性能
在这项研究中,我们研究了脉冲下降时间(Tfall)对基于sigeasse的选择器存储器(SOM)器件电特性的影响。我们的实验结果表明,在SiGeAsSe器件中,增加$\mathrm {T_{fall}}$会导致阈值电压(Vth)的增加和$\mathrm {V_{th}}$漂移的减少。优化后的器件具有显著的记忆窗口(bbb1v)和显著的抑制漂移特性(~ 10mv /dec)。在高温下的电测量表明,$\ mathm {T_{fall}}$是导致材料弛豫的重要因素之一,这些改进归因于有意诱导硫族化合物薄膜的重配置。此外,我们的研究结果表明,适当的$\ mathm {T_{fall}}$可以有效地减轻高温下内存窗口的退化。这些发现为材料弛豫在SOM器件中的作用提供了有价值的见解,可能有助于高性能存储器件的开发。
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来源期刊
IEEE Journal of the Electron Devices Society
IEEE Journal of the Electron Devices Society Biochemistry, Genetics and Molecular Biology-Biotechnology
CiteScore
5.20
自引率
4.30%
发文量
124
审稿时长
9 weeks
期刊介绍: The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.
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