Environmentally friendly synthesis and characterization of CuInS₂ thin films via electrostatic spray deposition of nanocolloids

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2025-04-14 DOI:10.1016/j.tsf.2025.140681
Mahsa Yadolahi , Yaser Vahidshad , Seyed Mohammad Mirkazemi , Somaye Alamalhoda
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Abstract

This study investigates the process parameters for electrostatic spray deposition of a stable colloid derived from copper indium sulfide composition. The research evaluates the influence of coating parameters on film deposition, structure, microstructure, and optical absorption properties. Analytical techniques including optical microscopy, scanning electron microscopy, X-ray diffraction, and ultraviolet-visible spectroscopy were employed. CuInS₂ colloid was deposited using the electrospray method with applied voltages of 24, 26, and 28 kV, flow rates of 1, 2, and 3 µL/min, and nozzle-to-substrate distances of 60, 80, and 100 mm onto fluorine-doped tin oxide glass substrates. Post-deposition, heat treatment at 500 °C was conducted to enhance crystallinity and adhesion, with sulfur powder added to ensure positive sulfur vapor pressure and prevent sulfur loss. Microstructural analysis via optical microscopy, scanning electron microscopy, and field-emission scanning electron microscopy identified best deposition conditions: 26 kV voltage, 2 µL/min flow rate, and an 80 mm nozzle-to-substrate distance, producing a uniform 1 µm-thick layer. The CuInS₂ layer exhibited strong visible light absorption, with an absorption edge at 760 nm and an energy gap of 1.5 eV.
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静电喷雾沉积纳米胶体的CuInS 2薄膜的环保合成与表征
本文研究了硫化铜铟组成物静电喷涂制备稳定胶体的工艺参数。研究评估了涂层参数对薄膜沉积、结构、微观结构和光学吸收性能的影响。分析技术包括光学显微镜、扫描电子显微镜、x射线衍射和紫外可见光谱。采用电喷雾法,在电压为24、26和28 kV,流速为1、2和3 μ L/min,喷嘴到衬底的距离为60、80和100 mm的条件下,将CuInS 2胶体沉积在含氟氧化锡玻璃衬底上。沉积后,在500℃下进行热处理以增强结晶度和附着力,并加入硫粉以保证硫的正蒸气压,防止硫的损失。通过光学显微镜、扫描电镜和场发射扫描电镜进行微观结构分析,确定了最佳沉积条件:26 kV电压、2 μ L/min流速、喷嘴到衬底距离80 mm,可生成均匀的1 μ m厚层。CuInS 2层具有较强的可见光吸收,吸收边缘在760 nm处,能隙为1.5 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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