Impact of indium doping on the structural, optical and radiation shielding characteristics of nano/quantum dots ZnAl2-xInxO4

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Applied Physics A Pub Date : 2025-04-17 DOI:10.1007/s00339-025-08494-y
Zein K. Heiba, Noura M. Farag, Sameh I. Ahmed, Hassan Elshimy, Mohamed Bakr Mohamed
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Abstract

ZnAl2-xInxO4 (x=0.0, 0.1, 0.15, 0.2, 0.25) samples were prepared employing the solid-state reaction approach. The structural inspection, utilizing Rietveld refinement and synchrotron x-ray diffraction patterns, revealed the substantial solubility threshold of indium within the ZnAl2O4 (ZAO) matrix and enabled the assessment of the inversion parameter, which expresses the distribution of cations among the tetrahedral and octahedral sites within the spinel conformation. The cation distribution fingerprint appeared on the Fourier transform infrared spectroscopy (FTIR) spectra. The transmission electron microscopy (TEM) technique revealed a little variation in particle size with an average value of 6 nm as determined from Rietveld x-ray analysis. Field emission scanning electron microscopy (FESEM) technique and energy dispersive X-ray spectroscopy (EDS) analysis were used to spot the morphology and elements inside the samples. The optical bandgap energy Eg value for ZAO is 4.43 eV and diminished to 4.41, 4.22, 4.22 and 3.96 eV for indium doping levels of x=0.1, 0.15, 0.2, and 0.25, respectively. Upon doping, optical absorption is significantly elevated in the ultraviolet region. CIE chromaticity diagrams revealed that the samples displayed cyan-blue colors depending on the amount of indium doping. The linear (LAC) and mass attenuation coefficient (MAC) values for all samples were maximum at the minimal energy value of 0.015 MeV. The LAC is elevated from 148 cm-1 to 246 cm-1 and MAC from 31.9 to 47.7 cm2/g for x=0.0 and 0.25, respectively. The half value layers (HVL), tenth value layers (TVL) and mean free path (MFP) values diminished as ZAO was doped with indium, indicating that the doped samples possess superior shielding properties compared to undoped ZAO. ZnAl2O4 doped with 0.1 or 0.15 indium disclosed marvels photoluminescence and has potential applications in phosphors, especially in light-emitting devices and displays.

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铟掺杂对ZnAl2-xInxO4纳米/量子点结构、光学和辐射屏蔽特性的影响
采用固相反应法制备ZnAl2-xInxO4 (x=0.0, 0.1, 0.15, 0.2, 0.25)样品。利用Rietveld细化和同步x射线衍射图进行结构检测,揭示了铟在ZnAl2O4 (ZAO)基体中的溶解度阈值,并评估了反转参数,该参数表达了尖晶石构象中四面体和八面体位置上阳离子的分布。在傅里叶变换红外光谱(FTIR)上出现了阳离子分布指纹。透射电子显微镜(TEM)技术显示粒径变化不大,Rietveld x射线分析测定的平均值为6 nm。采用场发射扫描电镜(FESEM)技术和能量色散x射线能谱(EDS)分析对样品的形貌和内部元素进行了检测。ZAO的光学带隙能Eg值为4.43 eV,当掺杂x=0.1、0.15、0.2和0.25时,分别降至4.41、4.22、4.22和3.96 eV。掺杂后,紫外区的光吸收显著提高。CIE色度图显示,样品显示蓝绿色,这取决于铟掺杂的量。所有样品的线性(LAC)和质量衰减系数(MAC)值在最小能量值为0.015 MeV时达到最大值。当x=0.0和0.25时,LAC从148 cm-1增加到246 cm-1, MAC从31.9增加到47.7 cm2/g。掺铟后ZAO的半值层(HVL)、10值层(TVL)和平均自由程(MFP)值减小,表明掺杂样品比未掺杂的ZAO具有更好的屏蔽性能。掺杂0.1或0.15铟的ZnAl2O4具有惊人的光致发光性能,在荧光粉,特别是发光器件和显示器方面具有潜在的应用前景。
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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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