Benchmarking Stochasticity behind Reproducibility: Denoising Strategies in Ta2O5 Memristors

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-04-19 DOI:10.1021/acsami.5c00257
Anna Nyáry, Zoltán Balogh, Botond Sánta, György Lázár, Nadia Jimenez Olalla, Juerg Leuthold, Miklós Csontos, András Halbritter
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Abstract

Reproducibility, endurance, driftless data retention, and fine resolution of the programmable conductance weights are key technological requirements against memristive artificial synapses in neural network applications. However, the inherent fluctuations in the active volume impose severe constraints on the weight resolution. In order to understand and push these limits, a comprehensive noise benchmarking and noise reduction protocol is introduced. Our approach goes beyond the measurement of steady-state readout noise levels and tracks the voltage-dependent noise characteristics all along the resistive switching I(V) curves. Furthermore, we investigate the tunability of the noise level by dedicated voltage cycling schemes in our filamentary Ta2O5 memristors. This analysis highlights a broad order-of-magnitude variability of the possible noise levels behind seemingly reproducible switching cycles. Our nonlinear noise spectroscopy measurements identify a subthreshold voltage region with voltage-boosted fluctuations. This voltage range enables the reconfiguration of the fluctuators without resistive switching, yielding a highly denoised state within a few subthreshold cycles.

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再现性背后的基准随机性:Ta2O5忆阻器的去噪策略
可编程电导权重的再现性、持久性、无漂移数据保留和精细分辨率是神经网络应用中对抗记忆性人工突触的关键技术要求。但是,活动体积的固有波动严重限制了权重分辨率。为了理解和突破这些限制,介绍了一种全面的噪声基准测试和降噪协议。我们的方法超越了稳态读出噪声水平的测量,并沿着电阻开关I(V)曲线跟踪电压相关的噪声特性。此外,我们研究了在我们的长丝Ta2O5记忆电阻器中使用专用电压循环方案的噪声电平的可调性。该分析强调了在看似可重复的开关周期背后可能的噪声水平的广泛数量级变化。我们的非线性噪声光谱测量确定了具有电压增强波动的亚阈值电压区域。该电压范围允许在没有电阻开关的情况下重新配置波动器,在几个亚阈值周期内产生高度去噪的状态。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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