Impact of q-dependent ionization frequency on sheath formation and behavior in magnetized collisionless plasma with non-extensive electron distribution
Abdelhak Missaoui , Oussama Jdaini , Mohamed El Bojaddaini , Morad El Kaouini , Hassan Chatei
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Abstract
This paper investigates the formation and structure of the sheath in a magnetized, collisionless, non-extensive plasma under the influence of electron impact ionization. A modified -dependent electron-neutral ionization frequency is derived for the ionization process in the sheath region, revealing a strong dependence of the ionization frequency on the non-extensive parameter . The results show that the ionization frequency significantly increases for lower values of (super-extensive electrons), leading to more energetic electrons and enhanced ionization effects. Additionally, a modified q-dependent Bohm criterion is derived, showing that the Bohm velocity limit for approaches the zero-source term limit. The impact of the -dependent source term on sheath characteristics such as charged particle densities, space charge density, electric field, ion flux, and ion velocities is thoroughly examined. It is found that the source term affects the sheath characteristics, especially in the case of a super-extensive electron distribution () case. Furthermore, the analysis reveals that increasing the magnetic field angle leads to a stronger electric field within the sheath, and that the sheath length is significantly influenced by both the non-extensive parameter and the magnetic field angle.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.