Yingyao Zhang;Hao Yu;Zhikang Yuan;Miaosong Gu;Fanping Deng;Xuejun Qian;Chenglian Lang
{"title":"Study of Nanoscale Microprotrusions on Metal Electrode Surfaces Under High Electric Fields","authors":"Yingyao Zhang;Hao Yu;Zhikang Yuan;Miaosong Gu;Fanping Deng;Xuejun Qian;Chenglian Lang","doi":"10.1109/TPS.2023.3288900","DOIUrl":null,"url":null,"abstract":"Microprotrusions under high electric fields are considered to be sources of metal vapor and microplasma on metal electrode surfaces and may even initiate vacuum breakdown in vacuum gaps. The mechanism of the phenomena has been studied for a long time. However, the dynamic evolution processes of microprotrusions under high electric fields considering the influence of the material properties are still not clear. The objective of this article is to study the dynamic evolution processes of the nanoscale microprotrusions on Cu and Cr electrode surfaces under high electric fields based on atomistic modeling. With considering the electron emission heating, surface charge, Coulomb, and electric field forces, a 3-D numerical model is established by coupling molecular dynamics (MD) and finite difference method (FDM), for simulating the dynamic evolution processes of the microprotrusions under high electric field. Furthermore, the influence of material properties on the dynamic evolution processes is discussed and compared between Cu and Cr. The simulation results show that the heating effect of the electron emission induced by an intense electric field could lead the microprotrusions to localized melting and subsequent elongation and may finally generate metal vapor in the vacuum gap. In addition, the material properties have a significant influence on the field-induced dynamic evolution processes of microprotrusions.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"51 8","pages":"2428-2435"},"PeriodicalIF":1.3000,"publicationDate":"2023-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10175056/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
Microprotrusions under high electric fields are considered to be sources of metal vapor and microplasma on metal electrode surfaces and may even initiate vacuum breakdown in vacuum gaps. The mechanism of the phenomena has been studied for a long time. However, the dynamic evolution processes of microprotrusions under high electric fields considering the influence of the material properties are still not clear. The objective of this article is to study the dynamic evolution processes of the nanoscale microprotrusions on Cu and Cr electrode surfaces under high electric fields based on atomistic modeling. With considering the electron emission heating, surface charge, Coulomb, and electric field forces, a 3-D numerical model is established by coupling molecular dynamics (MD) and finite difference method (FDM), for simulating the dynamic evolution processes of the microprotrusions under high electric field. Furthermore, the influence of material properties on the dynamic evolution processes is discussed and compared between Cu and Cr. The simulation results show that the heating effect of the electron emission induced by an intense electric field could lead the microprotrusions to localized melting and subsequent elongation and may finally generate metal vapor in the vacuum gap. In addition, the material properties have a significant influence on the field-induced dynamic evolution processes of microprotrusions.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.