On the Ion Flux From Beam Plasma to a Metal Target Irradiated by a Pulsed Electron Beam in the Forevacuum Pressure Range

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2023-08-21 DOI:10.1109/TPS.2023.3304058
Andrey V. Kazakov;Efim M. Oks;Nikolay A. Panchenko
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Abstract

We describe our investigations of the influence of electron beam parameters and working gas on the ion flux coming from the beam-produced plasma (beam plasma) to a target irradiated by a pulsed low-energy (up to 9 keV) electron beam in the forevacuum pressure range 4–15 Pa. The ion current from the beam-produced plasma to the target increases with increasing gas pressure and beam current, but decreases with increasing beam accelerating voltage. The use of gas with a greater ionization cross section leads to greater ion flux and correspondingly higher ion current to the irradiated target. The value of ion current to the target from the beam-plasma does not exceed 20% of the electron beam current. The observed dependencies of ion flux (current) to the target are due to changes in the beam-plasma density near the target. These results contribute to our understanding of the generation of beam-plasma by a pulsed electron beam and suggest the application of the ion flux from the beam-plasma to assist in electron-beam modification of dielectric materials in the forevacuum pressure region.
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前真空压力范围内脉冲电子束辐照金属靶束等离子体离子通量的研究
本文描述了在4-15 Pa前真空压力范围内,电子束参数和工作气体对从束流产生的等离子体(束流等离子体)到脉冲低能量(高达9 keV)电子束照射目标的离子通量的影响。从束流产生的等离子体到靶的离子电流随气体压力和束流电流的增大而增大,但随束流加速电压的增大而减小。使用电离截面更大的气体导致更大的离子通量和相应的更高的离子电流照射目标。从束流等离子体到目标的离子电流不超过电子束电流的20%。观察到的离子通量(电流)对目标的依赖性是由于目标附近的束等离子体密度的变化。这些结果有助于我们理解脉冲电子束等离子体的产生,并建议应用脉冲电子束等离子体的离子通量来辅助电子束在真空前压力区对介电材料进行修饰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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IEEE Transactions on Plasma Science Publication Information Table of Contents IEEE Transactions on Plasma Science Information for Authors Blank Page IEEE Transactions on Plasma Science Information for Authors
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