{"title":"Determination of 915-MHz Atmospheric Pressure Air Microwave Plasma Torch (MPT) Parameters","authors":"Ziyao Jie;Cheng Liu;Daolu Xia;Zhibo Zhang;Xuewei Zhao;Guixin Zhang","doi":"10.1109/TPS.2023.3236689","DOIUrl":null,"url":null,"abstract":"The gas temperature, electron temperature, and electron density are critical parameters that affect microwave plasma chemistry processes in industrial applications. Using optical emission spectroscopy (OES), the gas temperature and electron density of a 915-MHz atmospheric pressure air microwave plasma torch (MPT) were investigated at various absorbed power levels and radial positions. In addition, the variation in the electron temperatures of 915-MHz atmospheric pressure argon microwave plasma filaments was analyzed as a function of the absorbed power. The experimental results showed that: 1) the absorbed power had little effect on the radial gas temperature or electron density; 2) the skin effect was present in the 915-MHz atmospheric pressure air MPT, where it causing caused hollowing in the center of the radial gas temperature distribution; 3) the electron density reached approximately \n<inline-formula> <tex-math>$2\\times10$ </tex-math></inline-formula>\n13 cm−3 and was almost insensitive to variations in the absorbed power in the center of the 915-MHz atmospheric pressure air MPT; and 4) the upper limit of the 915-MHz atmospheric pressure microwave plasma filament electron temperature increased from approximately 1 to approximately 3 eV as the absorbed power increased from 2.0 to 6.3 kW.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"51 2","pages":"456-465"},"PeriodicalIF":1.3000,"publicationDate":"2023-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10026273/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 2
Abstract
The gas temperature, electron temperature, and electron density are critical parameters that affect microwave plasma chemistry processes in industrial applications. Using optical emission spectroscopy (OES), the gas temperature and electron density of a 915-MHz atmospheric pressure air microwave plasma torch (MPT) were investigated at various absorbed power levels and radial positions. In addition, the variation in the electron temperatures of 915-MHz atmospheric pressure argon microwave plasma filaments was analyzed as a function of the absorbed power. The experimental results showed that: 1) the absorbed power had little effect on the radial gas temperature or electron density; 2) the skin effect was present in the 915-MHz atmospheric pressure air MPT, where it causing caused hollowing in the center of the radial gas temperature distribution; 3) the electron density reached approximately
$2\times10$
13 cm−3 and was almost insensitive to variations in the absorbed power in the center of the 915-MHz atmospheric pressure air MPT; and 4) the upper limit of the 915-MHz atmospheric pressure microwave plasma filament electron temperature increased from approximately 1 to approximately 3 eV as the absorbed power increased from 2.0 to 6.3 kW.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.