Min-Ho Rim, Emil Agocs, Ronald Dixson, Prem Kavuri, András E Vladár, Ravi Kiran Attota
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引用次数: 5
Abstract
This paper reports high-throughput, light-based, through-focus scanning optical microscopy (TSOM) for detecting industrially relevant sub-50 nm tall nanoscale contaminants. Measurement parameter optimization to maximize the TSOM signal using optical simulations made it possible to detect the nanoscale contaminants. Atomic force and scanning electron microscopies were used as reference methods for comparison.
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