Adjustment of the Band Gap Energy According to Sizes of some Cubic Nanosemiconductors of IV, III-V and II-VI Groups

Q4 Materials Science Journal of Surface Science and Technology Pub Date : 2018-06-01 DOI:10.18311/JSST/2018/16433
H. Mammar, A. Benmansour, Fatima Kerroumi
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引用次数: 3

Abstract

The present work focuses on the modeling of the quantum confinement for several cubic semiconductors of the IV, IV-IV, III-IV, II-VI groups. In this way, we improve the actual methods of the band gap energy adjustment as function of the nanosemiconductors sizes. First, we used the Effective Mass Approximation (EMA) to investigate several confinement regimes such as weak, medium and strong. Then to ensure a good adjustment of this band gap energy, we recalculated the holes and the electrons effective masses of the cubic semiconductors via the K-P theory, the Luttinger parameters, and various interpolations. The results are compared with two other methods: a theoretical model of the Hyperbolic Band (HBM) and experimental method of the absorption spectra and photoluminescence. We found a better adjustment of the band gap energy according to nanosemiconductors size. These results may enhance considerably the efficiency of solar cells based on quantum dots by optimizing the nano-semiconductors size for each junction and converting the maximum of the solar spectrum. Indeed, we have found that the optimal quantum dot radii of all silicon tandem solar cells are 1.1nm for the upper junction and 1.5nm for the middle junction.
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根据一些IV、III-V和II-VI族立方纳米半导体的尺寸调节带隙能量
目前的工作重点是对IV、IV-IV、III-IV、II-VI族的几种立方半导体的量子约束进行建模。通过这种方式,我们改进了作为纳米半导体尺寸函数的带隙能量调节的实际方法。首先,我们使用有效质量近似(EMA)来研究几种约束机制,如弱约束、中等约束和强约束。然后,为了确保能带隙能量的良好调整,我们通过K-P理论、Luttinger参数和各种插值重新计算了立方半导体的空穴和电子有效质量。将结果和其他两种方法进行了比较:双曲带理论模型和吸收光谱和光致发光实验方法。我们发现根据纳米化学导体的尺寸可以更好地调节带隙能量。这些结果可以通过优化每个结的纳米半导体尺寸和转换太阳能光谱的最大值,显著提高基于量子点的太阳能电池的效率。事实上,我们已经发现,所有硅串联太阳能电池的最佳量子点半径对于上结为1.1nm,对于中结为1.5nm。
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期刊介绍: The Indian Society for Surface Science and Technology is an organization for the cultivation, interaction and dissemination of knowledge in the field of surface science and technology. It also strives to promote Industry-Academia interaction
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