Effects of material and dimension on TCF, frequency, and Q of radial contour mode AlN-on-Si MEMS resonators

Thi Dep Ha
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引用次数: 0

Abstract

This paper investigates the effects of material and dimension parameters on the frequency splitting, frequency drift, and quality factor (Q) of aluminium nitride (AlN)-on-n-doped/pure silicon (Si) microelectromechanical systems (MEMS) disk resonators through analysis and simulation. These parameters include the crystallographic orientation, dopant, substrate thickness, and temperature. The resonators operate in the elliptical, higher order, and flexural modes. The simulation results show that i) the turnover points of the resonators exist at 55 ​°C, –50 ​°C, 40 ​°C, and –10 ​°C for n-doped silicon with the doping concentration of 2 ​× ​1019 ​cm–3 and the Si thickness of 3.5 ​μm, and these points are shifted with the substrate thickness and mode variations; ii) compared with pure Si, the modal-frequency splitting for n-doped Si is higher and increases from 5% to 10% for all studied modes; iii) Q of the resonators depends on the temperature and dopant. Therefore, the turnover, modal-frequency splitting, and Q of the resonators depend on the thickness and material of the substrate and the temperature. This work offers an analysis and design platform for high-performance MEMS gyroscopes as well as oscillators in terms of the temperature compensation by n-doped Si.

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材料和尺寸对硅MEMS谐振腔径向轮廓模AlN的TCF、频率和Q的影响
通过分析和仿真,研究了材料参数和尺寸参数对氮化铝(AlN)-氮掺杂/纯硅(Si)微机电系统(MEMS)圆盘谐振器的分频、频漂和品质因子(Q)的影响。这些参数包括晶体取向、掺杂物、衬底厚度和温度。谐振器在椭圆、高阶和弯曲模式下工作。仿真结果表明:1)当掺杂浓度为2 × 1019 cm-3、Si厚度为3.5 μm时,n掺杂硅在55°C、-50°C、40°C和-10°C时,谐振腔的翻转点存在,且这些点随衬底厚度和模式的变化而发生位移;ii)与纯Si相比,n掺杂Si的模频分裂更高,所有模式的模频分裂从5%增加到10%;iii)谐振腔的Q值取决于温度和掺杂剂。因此,谐振器的周转率、模频分裂和Q取决于衬底的厚度和材料以及温度。这项工作为高性能MEMS陀螺仪和振荡器的n掺杂温度补偿提供了一个分析和设计平台。
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来源期刊
Journal of Electronic Science and Technology
Journal of Electronic Science and Technology Engineering-Electrical and Electronic Engineering
CiteScore
4.30
自引率
0.00%
发文量
1362
审稿时长
99 days
期刊介绍: JEST (International) covers the state-of-the-art achievements in electronic science and technology, including the most highlight areas: ¨ Communication Technology ¨ Computer Science and Information Technology ¨ Information and Network Security ¨ Bioelectronics and Biomedicine ¨ Neural Networks and Intelligent Systems ¨ Electronic Systems and Array Processing ¨ Optoelectronic and Photonic Technologies ¨ Electronic Materials and Devices ¨ Sensing and Measurement ¨ Signal Processing and Image Processing JEST (International) is dedicated to building an open, high-level academic journal supported by researchers, professionals, and academicians. The Journal has been fully indexed by Ei INSPEC and has published, with great honor, the contributions from more than 20 countries and regions in the world.
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