{"title":"Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography","authors":"Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, C. Kuang, Haifeng Li, Xu Liu","doi":"10.1117/1.AP.4.6.066002","DOIUrl":null,"url":null,"abstract":"Abstract. Direct laser writing (DLW) enables arbitrary three-dimensional nanofabrication. However, the diffraction limit poses a major obstacle for realizing nanometer-scale features. Furthermore, it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems, which cannot perform high-throughput lithography. To overcome these challenges, a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study, based on two-photon polymerization DLW. The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures. The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.","PeriodicalId":33241,"journal":{"name":"Advanced Photonics","volume":"4 1","pages":"066002 - 066002"},"PeriodicalIF":20.6000,"publicationDate":"2022-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Photonics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.AP.4.6.066002","RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 6
Abstract
Abstract. Direct laser writing (DLW) enables arbitrary three-dimensional nanofabrication. However, the diffraction limit poses a major obstacle for realizing nanometer-scale features. Furthermore, it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems, which cannot perform high-throughput lithography. To overcome these challenges, a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study, based on two-photon polymerization DLW. The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures. The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.
期刊介绍：
Advanced Photonics is a highly selective, open-access, international journal that publishes innovative research in all areas of optics and photonics, including fundamental and applied research. The journal publishes top-quality original papers, letters, and review articles, reflecting significant advances and breakthroughs in theoretical and experimental research and novel applications with considerable potential.
The journal seeks high-quality, high-impact articles across the entire spectrum of optics, photonics, and related fields with specific emphasis on the following acceptance criteria:
-New concepts in terms of fundamental research with great impact and significance
-State-of-the-art technologies in terms of novel methods for important applications
-Reviews of recent major advances and discoveries and state-of-the-art benchmarking.
The journal also publishes news and commentaries highlighting scientific and technological discoveries, breakthroughs, and achievements in optics, photonics, and related fields.
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