Features of ion generation by a picosecond laser in the range of 1011–1013 W cm−2 power densities

IF 1.3 Q3 ORTHOPEDICS Plasma Research Express Pub Date : 2021-11-03 DOI:10.1088/2516-1067/ac3628
S. Kondrashev, E. Beebe, T. Kanesue, M. Okamura, R. Scott
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Abstract

Picosecond lasers (ps-lasers) have significant advantages for the generation of low charge state ions compared to nanosecond lasers because the influence of heat conductivity on a solid target is almost negligible in the case of ps-laser ablation for laser pulse durations less than 10 ps. However, there is no comprehensive data on ion yields for different elements and target irradiation conditions for laser power densities at the target surface around and below 1013 W cm−2, which is of interest to our study of such plasmas as a source of low charge state ions for various applications, particularly for external injection of those ions into an Electron Beam Ion Source (EBIS). We investigated ion generation from Al, Ti, Cu, Nb and Ta target elements by a ps-laser with power densities in the range of 1011–1013 W cm−2 at the target surface. A ps-laser with 1.27 mJ maximum energy within an 8 ps pulse and repetition rate up to 400 Hz has been used to generate a laser-ablated plasma. Dependencies of ion current versus time, total charge of registered ions as well as ion kinetic energy distributions are characterized using a Faraday cup. Significant difference in ion current dynamics between first, second and following shots onto the same target spot was found for all five target elements. The total charge of ions registered by the Faraday cup increases linearly with increasing laser pulse energy and is almost independent of the target element and number of shots onto the same target spot for all five target elements studied. The results obtained give us a basis for specification and design of the source of low charge state ions for external injection into EBIS.
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1011–1013 W cm−2功率密度范围内皮秒激光器产生离子的特征
与纳秒激光器相比,皮秒激光器(ps激光器)在产生低电荷态离子方面具有显著优势,因为在激光脉冲持续时间小于10 ps的情况下,皮秒激光烧蚀对固体目标的导热性影响几乎可以忽略不计。然而,在目标表面约1013 W cm−2及以下的激光功率密度下,没有关于不同元素和目标照射条件下离子产量的综合数据。这对我们研究等离子体作为各种应用的低电荷态离子源,特别是将这些离子外部注入电子束离子源(EBIS)很有兴趣。利用功率密度在1011-1013 W cm−2范围内的ps激光器,研究了Al, Ti, Cu, Nb和Ta靶元素在靶表面的离子生成。在8ps脉冲和高达400hz的重复频率下,使用最大能量为1.27 mJ的ps激光器产生激光烧蚀等离子体。利用法拉第杯表征了离子电流与时间的关系、注册离子的总电荷以及离子动能分布。对于所有五种目标元素,在同一目标点上的第一次,第二次和后续射击之间的离子电流动力学存在显着差异。法拉第杯记录的离子总电荷随激光脉冲能量的增加而线性增加,并且几乎与所研究的五种靶元素的靶元素和射向同一靶点的次数无关。所得结果为外注入EBIS的低电荷态离子源的规格和设计提供了依据。
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来源期刊
Plasma Research Express
Plasma Research Express Energy-Nuclear Energy and Engineering
CiteScore
2.60
自引率
0.00%
发文量
15
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