Basis Set Effects on the Stabilities and Interaction Energies of Small Amide Molecules Adsorbed on Kaolinite Surface

IF 1 Q4 CHEMISTRY, MULTIDISCIPLINARY Indonesian Journal of Chemistry Pub Date : 2023-08-15 DOI:10.22146/ijc.79795
Najwa-Alyani Mohd Nabil, L. Ang, S. Sulaiman
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Abstract

Adsorptions of small amide molecules, acetamide (AA) and N-methyl-acetamide (NMA) on the surface of kaolinite are investigated in this study. The focus is on the basis set effects towards the stabilities and the interaction energies of the molecules on the Al–O surface. With a fixed B3LYP functional, we increased the size of the basis sets for the single-point calculations, to find the converged interaction energies and obtain the relative stabilities. We found that, under the direct usage of Pople-type and Dunning’s correlation consistent basis sets, it is not possible to achieve the pattern of convergence for the interaction energies and the relative stabilities. Compared to the complete basis set (CBS) extrapolation scheme, the double zeta basis sets deviated the most, in the range of 21 to 27%, while it is from 1 to 7% for the triple zeta basis sets. Based on the results, we suggest using 6-311++G(2df,2pd) or cc-pVQZ for energy-related quantities. Compared to AA, NMA attached more strongly by 0.5 eV on the surface of Al–O.
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基集对高岭石表面吸附小酰胺分子稳定性和相互作用能的影响
研究了酰胺小分子、乙酰胺(AA)和N-甲基乙酰胺(NMA)在高岭石表面的吸附行为。重点是对Al–O表面分子的稳定性和相互作用能的基集效应。对于固定的B3LYP泛函,我们增加了单点计算的基集的大小,以找到收敛的相互作用能并获得相对稳定性。我们发现,在直接使用Pople型和Dunning相关一致基集的情况下,不可能实现相互作用能量和相对稳定性的收敛模式。与完全基集(CBS)外推方案相比,双ζ基集的偏差最大,在21%至27%的范围内,而三ζ基组的偏差为1%至7%。基于这些结果,我们建议使用6-311++G(2df,2pd)或cc-pVQZ作为能量相关量。与AA相比,NMA在Al–O表面的附着强度为0.5 eV。
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来源期刊
Indonesian Journal of Chemistry
Indonesian Journal of Chemistry CHEMISTRY, MULTIDISCIPLINARY-
CiteScore
2.30
自引率
11.10%
发文量
106
审稿时长
15 weeks
期刊介绍: Indonesian Journal of Chemistry is a peer-reviewed, open access journal that publishes original research articles, review articles, as well as short communication in all areas of chemistry, including educational chemistry, applied chemistry, and chemical engineering.
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