M. Hernández, G. Álvarez-Romero, M. Rivera, Simplicio González-Montiel, C. H. Rios-Reyes, L. Mendoza-Huizar
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引用次数: 0
Abstract
: In the present work, the influence of the concentration of bitartrate ions (HT) on the copper electrodeposition process was analyzed. The study was carried out from an aqueous solution containing 0.001 M of CuX (where X = (NO 3– ) 2 ,(Cl – ) 2 , S O 4 2– ) and x M KHT (where x = 0.005 M, 0.01 M, and 0.015 M). From voltammetric and chronoamperometric studies, the results indicate that copper electrodeposition is a diffusion-controlled process. The current density transients were well described through a kinetic me chanism involving capacitive and faradaic contributions. The diffusion coefficient values of Cu 1+ and Cu 2+ result to be similar at the different concentration values of potassium bitartrate used in this work.
本文分析了酒石酸盐离子(HT)浓度对铜电沉积过程的影响。该研究是在含有0.001 M CuX(其中X=(NO3-)2、(Cl-)2、S O 4 2-)和X M KHT(其中X=0.005 M、0.01 M和0.015 M)的水溶液中进行的。从伏安法和计时电流法的研究结果表明,铜电沉积是一个扩散控制的过程。通过涉及电容和法拉第贡献的动力学机制,很好地描述了电流密度瞬态。在本工作中使用的酒石酸钾的不同浓度值下,Cu1+和Cu2+的扩散系数值相似。
期刊介绍:
Croatica Chemica Acta (Croat. Chem. Acta, CCA), is an international journal of the Croatian Chemical Society publishing scientific articles of general interest to chemistry.