MSP designing with optimal fractional PI–PD controller for IPTD processes

IF 1.3 Q4 ENGINEERING, CHEMICAL Chemical Product and Process Modeling Pub Date : 2022-11-21 DOI:10.1515/cppm-2022-0041
S. Sengupta, Somak Karan, C. Dey
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引用次数: 1

Abstract

Abstract An effective tuning methodology of modified Smith predictor (MSP) based fractional controller designing for purely integrating time delayed (IPTD) processes is reported here. IPTD processes with pole at the origin are truly difficult to control; exhibit large oscillations once get disturbed from their steady state. Proposed MSP design consists of fractional PI (proportional-integral) and fractional PD (proportional-derivative) controllers together with P (proportional) controller. Fractional controllers are competent to provide improved closed loop responses due to flexibility of additional tuning parameters. Fractional tuning parameters of PI and PD controllers are derived through optimization algorithms where integral absolute error (IAE) is considered as cost function. Efficacy of the proposed methodology is validated for IPTD processes having wide range of time delay. Stability and robustness issues are explored under process model uncertainties with small gain theorem. Performance of the proposed MSP-FO(PI–PD) controller is validated through simulation study relating five IPTD process models. Overall satisfactory closed loop responses are observed for each case during transient as well as steady state operational phases.
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IPTD过程最优分数PI-PD控制器的MSP设计
摘要本文报道了一种基于改进Smith预测器(MSP)的分数控制器设计的有效整定方法,用于纯积分时滞(IPTD)过程。在原点有极点的IPTD过程确实难以控制;一旦从稳定状态中受到干扰,就会表现出巨大的振荡。所提出的MSP设计由分数阶PI(比例积分)控制器和分数阶PD(比例导数)控制器以及P(比例)控制器组成。分数控制器由于附加调谐参数的灵活性,能够提供更好的闭环响应。以积分绝对误差(IAE)为代价函数,通过优化算法推导出PI控制器和PD控制器的分数阶整定参数。在具有大范围时滞的IPTD过程中验证了该方法的有效性。利用小增益定理探讨了过程模型不确定性下的稳定性和鲁棒性问题。通过对5个IPTD过程模型的仿真研究,验证了所提出的MSP-FO(PI-PD)控制器的性能。在瞬态和稳态运行阶段,观察到每种情况下的总体满意的闭环响应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Chemical Product and Process Modeling
Chemical Product and Process Modeling ENGINEERING, CHEMICAL-
CiteScore
2.10
自引率
11.10%
发文量
27
期刊介绍: Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Topics: equation oriented and modular simulation optimization technology for process and materials design, new modeling techniques shortcut modeling and design approaches performance of commercial and in-house simulation and optimization tools challenges faced in industrial product and process simulation and optimization computational fluid dynamics environmental process, food and pharmaceutical modeling topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes.
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