Chsracterization of Low Temperature Plasma Ion Nitriding (PIN) of Inconel 600 and 601 Alloys

Abstract

In this study an effort has been made for the plasma ion nitriding (PIN) of Inconel 600 and 601 alloys at low temperatures. After plasma ion nitriding and microstructural study, growth kinetics of nitrided layer formation and wear properties were investigated by various characterization techniques such as scanning electron microscope (SEM), X-ray diffraction (XRD) analysis, micro-hardness measurement and wear test by pin on disk technique. It was found that surface micro-hardness increases after the PIN process. A mixed peak of epsilon (ε) and fcc (γ) phase was detected for all temperature range (350 to 450 C), while the chromium nitride (CrN) phase was detected at elevated temperature range ~450 C in Inconel 601 alloy. The calculated values of the diffusion coefficient and activation energy for the diffusion of nitrogen are in accordance with the literature. Volume loss and wear rate of the plasma nitrided samples decreases, but it increases as PIN process temperature increases.