Characterization and physical property studies of Sn, Al doped and co-doped CdO thin films

IF 1.2 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Revista Mexicana De Fisica Pub Date : 2023-01-03 DOI:10.31349/revmexfis.69.011002
W. Azzaoui, M. Medles, K. Salim, A. Nakrela, A. Bouzidi, R. Miloua, M. Amroun, M. Khadraoui
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Abstract

TM (TM = Sn, Al) doped and co-doped CdO thin films were deposited by spray pyrolysis technique on glass substrate at temperature 350 ˚C. The effect of TM doping and co-doping on the structural, morphological, optical, and electrical properties of CdO thin films was investigated. The obtained films are crystallized in the cubic structure and oriented along the preferential (111) crystallographic plane. The average optical transmittance reaches 79% in the visible range for Sn doped CdO films and 74% for Al-Sn co-doped films. The gap values of the obtained samples are between 2.29 and 2.49 eV. All the deposited films exhibit n-type conductivity with a low electrical resistivity of 7.85.10-4 Ω.cm obtained for Al doped CdO films.  
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Sn、Al掺杂及共掺杂CdO薄膜的表征及物理性质研究
在350℃的温度下,采用喷雾热解技术在玻璃衬底上沉积了TM (TM = Sn, Al)掺杂和共掺杂的CdO薄膜。研究了TM掺杂和共掺杂对CdO薄膜结构、形貌、光学和电学性能的影响。所得到的薄膜以立方结构结晶,并沿优先(111)晶体平面取向。Sn掺杂的CdO薄膜在可见光范围内的平均透过率达到79%,Al-Sn共掺杂薄膜的平均透过率达到74%。所得样品的间隙值在2.29 ~ 2.49 eV之间。所有沉积膜均具有n型导电性,电阻率为7.85.10-4 Ω。得到了掺杂Al的CdO薄膜的cm。
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来源期刊
Revista Mexicana De Fisica
Revista Mexicana De Fisica 物理-物理:综合
CiteScore
2.20
自引率
11.80%
发文量
87
审稿时长
4-8 weeks
期刊介绍: Durante los últimos años, los responsables de la Revista Mexicana de Física, la Revista Mexicana de Física E y la Revista Mexicana de Física S, hemos realizado esfuerzos para fortalecer la presencia de estas publicaciones en nuestra página Web ( http://rmf.smf.mx).
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