Pulse-Programmed Short-Term Plasticity and Long-Term Potentiation of MoS2 Memristive Devices

IF 2.3 Q3 NANOSCIENCE & NANOTECHNOLOGY IEEE Nanotechnology Magazine Pub Date : 2023-10-01 DOI:10.1109/MNANO.2023.3297105
S. Ki, Mingze Chen, Xiaogan Liang
{"title":"Pulse-Programmed Short-Term Plasticity and Long-Term Potentiation of MoS2 Memristive Devices","authors":"S. Ki, Mingze Chen, Xiaogan Liang","doi":"10.1109/MNANO.2023.3297105","DOIUrl":null,"url":null,"abstract":"Short-term plasticity (STP) and long-term potentiation (LTP) properties of neural synapses are crucial for developing complex neuromorphic systems and functions. In this work, we fabricated two-terminal memristors with multi-layer MoS2 channels and investigated pulse-programmed short-term and long-term synaptic responses. This work indicates that MoS2 memristors exhibit different magnitudes of STP and LTP effects under different pulse programming settings. Specifically, we utilized the paired-pulse facilitation (PPF) function for fitting experimentally measured relaxation curves of MoS2 memristors to quantitatively evaluate the relative dominance of STP and LTP effects. Such analytic results show that the absolute magnitudes of both STP and LTP effects in a memristor increase with increasing pulse frequency, pulse voltage (or amplitude), pulse duty cycle, and a total number of applied pulses, whereas the relative dominance levels of these two effects are typically not in a simple monotonous relationship with these pulse parameters. This indicates that the programming pulse parameters profoundly affect pulse-field-mediated charge trapping and S-vacancy migration processes which are responsible for the observed STP and LTP effects, respectively. This work provides a useful guideline for activating STP and LTP effects in emerging memristive devices based on 2D layered semiconductors, which could be deployed for making synaptic nodes in hardware-based artificial neural networks or neuromorphic sensory devices capable of sensing spatiotemporal events.","PeriodicalId":44724,"journal":{"name":"IEEE Nanotechnology Magazine","volume":"17 1","pages":"24-29"},"PeriodicalIF":2.3000,"publicationDate":"2023-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Nanotechnology Magazine","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MNANO.2023.3297105","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"NANOSCIENCE & NANOTECHNOLOGY","Score":null,"Total":0}
引用次数: 0

Abstract

Short-term plasticity (STP) and long-term potentiation (LTP) properties of neural synapses are crucial for developing complex neuromorphic systems and functions. In this work, we fabricated two-terminal memristors with multi-layer MoS2 channels and investigated pulse-programmed short-term and long-term synaptic responses. This work indicates that MoS2 memristors exhibit different magnitudes of STP and LTP effects under different pulse programming settings. Specifically, we utilized the paired-pulse facilitation (PPF) function for fitting experimentally measured relaxation curves of MoS2 memristors to quantitatively evaluate the relative dominance of STP and LTP effects. Such analytic results show that the absolute magnitudes of both STP and LTP effects in a memristor increase with increasing pulse frequency, pulse voltage (or amplitude), pulse duty cycle, and a total number of applied pulses, whereas the relative dominance levels of these two effects are typically not in a simple monotonous relationship with these pulse parameters. This indicates that the programming pulse parameters profoundly affect pulse-field-mediated charge trapping and S-vacancy migration processes which are responsible for the observed STP and LTP effects, respectively. This work provides a useful guideline for activating STP and LTP effects in emerging memristive devices based on 2D layered semiconductors, which could be deployed for making synaptic nodes in hardware-based artificial neural networks or neuromorphic sensory devices capable of sensing spatiotemporal events.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
二硫化钼记忆器件的脉冲程序化短期可塑性和长期增强
神经突触的短期可塑性(STP)和长期增强性(LTP)特性对于复杂的神经形态系统和功能的发展至关重要。在这项工作中,我们制作了具有多层二硫化钼通道的双端忆阻器,并研究了脉冲编程的短期和长期突触反应。这项工作表明,在不同的脉冲编程设置下,二硫化钼忆阻器表现出不同幅度的STP和LTP效应。具体来说,我们利用配对脉冲促进(PPF)函数拟合实验测量的MoS2忆阻器弛豫曲线,以定量评估STP和LTP效应的相对优势。分析结果表明,在忆阻器中,STP和LTP效应的绝对值随脉冲频率、脉冲电压(或幅值)、脉冲占空比和施加脉冲总数的增加而增加,而这两种效应的相对优势水平通常不是与这些脉冲参数呈简单单调的关系。这表明编程脉冲参数深刻地影响了脉冲场介导的电荷捕获和s -空位迁移过程,这两个过程分别负责观察到的STP和LTP效应。这项工作为在基于二维层状半导体的新兴记忆器件中激活STP和LTP效应提供了有用的指导,这些器件可用于在基于硬件的人工神经网络或能够感知时空事件的神经形态感觉器件中制造突触节点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
IEEE Nanotechnology Magazine
IEEE Nanotechnology Magazine NANOSCIENCE & NANOTECHNOLOGY-
CiteScore
2.90
自引率
6.20%
发文量
46
期刊介绍: IEEE Nanotechnology Magazine publishes peer-reviewed articles that present emerging trends and practices in industrial electronics product research and development, key insights, and tutorial surveys in the field of interest to the member societies of the IEEE Nanotechnology Council. IEEE Nanotechnology Magazine will be limited to the scope of the Nanotechnology Council, which supports the theory, design, and development of nanotechnology and its scientific, engineering, and industrial applications.
期刊最新文献
Guest Editorial [Guest Editorial] The MENED Program at Nanotechnology Council [Column] The Editors’ Desk [Editor's Desk] President's Farewell Message [President's Farewell Message] 2023 Index IEEE Nanotechnology Magazine Vol. 17
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1