Assessment of microleakage and interfacial adaptation following simultaneous activation technique in primary molars

IF 0.6 Q4 DENTISTRY, ORAL SURGERY & MEDICINE Pediatric Dental Journal Pub Date : 2023-04-01 DOI:10.1016/j.pdj.2022.10.001
Heer Kadhi, Jasmin Winnier, Ishani Ratnaparkhi
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Abstract

Background

Simultaneous Activation Technique is a newer method of co-curing resin modified glass ionomer (RMGI) and self-etch adhesive.

Aim

Assessment of microleakage and interfacial adaptation following simultaneous activation technique in primary molars.

Design

Standardized Class I cavities were prepared in 66 non-carious primary molars and randomly allocated to Group I – Simultaneous activation of RMGI and self-etch adhesive (SAT); Group II – SAT with enamel etching (SAT + EE); Group III – Conventional Sandwich Technique (ST) and restored with bulk fill composite. Time taken was calculated using stopwatch. Microleakage was assessed using dye penetration method under stereomicroscope. Seven samples per group were sent for Scanning Electron Microscopy (SEM) analysis. One-Way Analysis of Variance and Post- Hoc Tukey's test were applied at P < 0.05.

Results

Mean microleakage of group I, II and III were 1.23, 1.41 and 1.59 respectively. Time taken was least for SAT followed by SAT + EE and ST group. Statistically significant difference was seen between SAT and ST group (p < 0.0001) and SAT + EE and ST group (p < 0.0001). SEM analysis showed better mean interfacial adaptation in SAT + EE (1.00) followed by ST (2.14) and SAT (3.57) group. Difference between SAT + EE and SAT group was significant (p = 0.005).

Conclusion

Simultaneous activation technique with selective enamel etching resulted in less microleakage and better interfacial adaptation.

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磨牙同步活化技术对微渗漏及界面适应性的影响
同时活化技术是树脂改性玻璃离聚体(RMGI)与自蚀刻胶粘剂共固化的一种新方法。目的评价同步激活技术对初生磨牙微渗漏及界面适应性的影响。设计标准化I类牙槽体66颗无龋初生磨牙,随机分配到I组-同时激活RMGI和自蚀刻胶(SAT);第二组:SAT +釉质腐蚀(SAT + EE);第三组-传统夹层技术(ST)和大块填充复合材料修复。所用时间是用秒表计算的。体视显微镜下采用染料渗透法评价微渗漏。每组取7个样品进行扫描电子显微镜(SEM)分析。P <采用单因素方差分析和事后Tukey检验;0.05.结果I、II、III组平均微漏分别为1.23、1.41、1.59。SAT组所需时间最少,其次为SAT + EE组和ST组。SAT组与ST组比较差异有统计学意义(p <0.0001), SAT + EE和ST组(p <0.0001)。SEM分析显示,SAT + EE组的平均界面适应性较好(1.00),其次是ST组(2.14)和SAT组(3.57)。SAT + EE与SAT组比较差异有统计学意义(p = 0.005)。结论选择性牙釉质腐蚀同时活化技术微渗漏少,界面适应性好。
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来源期刊
Pediatric Dental Journal
Pediatric Dental Journal DENTISTRY, ORAL SURGERY & MEDICINE-
CiteScore
1.40
自引率
0.00%
发文量
24
审稿时长
26 days
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