{"title":"An enhancement in series cascade control for non-minimum phase system","authors":"Manish Yadav","doi":"10.1515/cppm-2021-0046","DOIUrl":null,"url":null,"abstract":"Abstract This work reveals an Internal Model Control (IMC)-based series cascade control for the non-minimum phase and time delay process. The combination of a higher-order fractional IMC filter and inverse response compensator for designing the outer loop controller illustrates the uniqueness of this work. For the time delay term, a higher-order approximation is considered. The standard IMC-PID structure adopts for the inner loop controller design. While the higher-order fractional filter coupled with inverse response compensator takes for the design of the outer loop controller. The suggested scheme demonstrates enhanced exhibition for setpoint tracking and disturbance rejection. Moreover, the sensitivity analysis is also accomplished to determine the robustness of the closed-loop system under process parameter variations.","PeriodicalId":9935,"journal":{"name":"Chemical Product and Process Modeling","volume":"18 1","pages":"51 - 71"},"PeriodicalIF":1.0000,"publicationDate":"2021-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Product and Process Modeling","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1515/cppm-2021-0046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
引用次数: 1
Abstract
Abstract This work reveals an Internal Model Control (IMC)-based series cascade control for the non-minimum phase and time delay process. The combination of a higher-order fractional IMC filter and inverse response compensator for designing the outer loop controller illustrates the uniqueness of this work. For the time delay term, a higher-order approximation is considered. The standard IMC-PID structure adopts for the inner loop controller design. While the higher-order fractional filter coupled with inverse response compensator takes for the design of the outer loop controller. The suggested scheme demonstrates enhanced exhibition for setpoint tracking and disturbance rejection. Moreover, the sensitivity analysis is also accomplished to determine the robustness of the closed-loop system under process parameter variations.
期刊介绍:
Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Topics: equation oriented and modular simulation optimization technology for process and materials design, new modeling techniques shortcut modeling and design approaches performance of commercial and in-house simulation and optimization tools challenges faced in industrial product and process simulation and optimization computational fluid dynamics environmental process, food and pharmaceutical modeling topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes.