The chemical reaction of thioindole and [20] fullerene and the use of DFT to estimate some quantum chemical descriptors

IF 2.1 3区 化学 Q3 CHEMISTRY, MULTIDISCIPLINARY Journal of Sulfur Chemistry Pub Date : 2023-02-01 DOI:10.1080/17415993.2022.2139146
Ahmad AB Yosef Kinani , Evan Abdulkareem Mahmood , Seyed Mohammad Shoaei , Mohammad Reza Poor Heravi , Sepideh Habibzadeh , Abdol Ghaffar Ebadi , Issa Amini , Esmail Vessally
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Abstract

In this study, the solvent effects are probed on the chemical reaction of the (E)-3-thiophene-2-yl-indoline-2-thione (I) and [20] fullerene, and the resulted complex (Ia) via the density functional theory (DFT). To characterize the synchronicity of the reaction and its correlation with activation energy, we estimated the energy barrier of transition states (ETS1 and ETS2) in the used solvents. The highest ETS1 and ETS2 value are found in water solvent, whereas the lowest ETS1 and ETS2 value are considered in the gas phase. Formation of the TS2 appears energetically less favorable due to the non-bonding electrostatic repulsion among the sulfur heteroatoms and C20, also the π–stacking between the thiophene ring and nanocage, which affects the stability of the TSs. The most thermodynamic stability, the adsorption energy difference among liquid phase and gas phase (ΔEl-g = ElEg), and the most polarity (µ) belongs to stabilizing effect of water solvent on Ia, whereas the lowest thermodynamic stability, the lowest released ΔEl-g and the least polarity belongs to optimization of Ia in the gas phase. This stabilizing effect is attributed to the possibility of hydrogen bonding and dipole–dipole interaction in the water. The n→π* donation of N–C═S leads to a stronger interaction between sulfur heteroatom of I and fullerene. In contrast to the previous report on the produced thio-oxindoles in organic solvents, toluene was found to be the best solvent in terms of the highest yield and the shortest reaction time, in this case, adsorption takes place in water with no catalyst addition.

Here, we have focused on chemical reaction of I and C20 to produce Ia complex via the optimized TSs in the gas phase, toluene, dichloromethane, methanol, acetonitrile, dimethyl sulfoxide and water, using DFT approach.

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硫吲哚与[20]富勒烯的化学反应及用DFT估计一些量子化学描述子
在本研究中,通过密度泛函理论(DFT)探讨了溶剂对(E)-3-噻吩-2-基吲哚啉-2-硫酮(I)和[20]富勒烯的化学反应以及由此产生的络合物(Ia)的影响。为了表征反应的同步性及其与活化能的相关性,我们估计了所用溶剂中过渡态(ETS1≠和ETS2≠)的能垒。在水溶剂中发现最高的ETS1≠和ETS2≠值,而在气相中则认为最低的ETS1≈和ETs2≠值。由于硫杂原子和C20之间的非键静电排斥,以及噻吩环和纳米笼之间的π–堆积,TS2的形成在能量上似乎不太有利,这影响了TS的稳定性。最具热力学稳定性的是液相和气相之间的吸附能差(ΔE l-g = E l−E g),最极性(µ)属于水溶剂对Ia的稳定作用,而最低的热力学稳定性、最低的释放ΔE l-g和最小的极性属于Ia在气相中的优化。这种稳定作用归因于水中氢键和偶极-偶极相互作用的可能性。n→π*捐赠N–C═S导致I的硫杂原子与富勒烯之间更强的相互作用。与先前关于在有机溶剂中生产硫代环氧吲哚的报告相比,发现甲苯是产率最高、反应时间最短的最佳溶剂,在这种情况下,在不添加催化剂的情况下在水中进行吸附。在这里,我们使用DFT方法,重点研究了I和C20在气相、甲苯、二氯甲烷、甲醇、乙腈、二甲基亚砜和水中的化学反应,通过优化的TSs产生Ia络合物。图形摘要
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来源期刊
Journal of Sulfur Chemistry
Journal of Sulfur Chemistry CHEMISTRY, MULTIDISCIPLINARY-
CiteScore
4.10
自引率
9.10%
发文量
38
审稿时长
6-12 weeks
期刊介绍: The Journal of Sulfur Chemistry is an international journal for the dissemination of scientific results in the rapidly expanding realm of sulfur chemistry. The journal publishes high quality reviews, full papers and communications in the following areas: organic and inorganic chemistry, industrial chemistry, materials and polymer chemistry, biological chemistry and interdisciplinary studies directly related to sulfur science. Papers outlining theoretical, physical, mechanistic or synthetic studies pertaining to sulfur chemistry are welcome. Hence the target audience is made up of academic and industrial chemists with peripheral or focused interests in sulfur chemistry. Manuscripts that truly define the aims of the journal include, but are not limited to, those that offer: a) innovative use of sulfur reagents; b) new synthetic approaches to sulfur-containing biomolecules, materials or organic and organometallic compounds; c) theoretical and physical studies that facilitate the understanding of sulfur structure, bonding or reactivity; d) catalytic, selective, synthetically useful or noteworthy transformations of sulfur containing molecules; e) industrial applications of sulfur chemistry; f) unique sulfur atom or molecule involvement in interfacial phenomena; g) descriptions of solid phase or combinatorial methods involving sulfur containing substrates. Submissions pertaining to related atoms such as selenium and tellurium are also welcome. Articles offering routine heterocycle formation through established reactions of sulfur containing substrates are outside the scope of the journal.
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