Comparative study on solid-solid interfacial reaction and bonding property of Sn-Ag-Cu/Ni-P joints by laser and reflow soldering

IF 0.7 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Microelectronics International Pub Date : 2023-03-27 DOI:10.1108/mi-11-2022-0185
Yuehua Wu, Z.J. Zhang, L.D. Chen, X. Zhou
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引用次数: 1

Abstract

Purpose Laser soldering has attracted attention as an alternative soldering process for microsoldering due to its localized and noncontact heating, a rapid rise and fall in temperature, fluxless and easy automation compared to reflow soldering. Design/methodology/approach In this study, the metallurgical and mechanical properties of the Sn3.0Ag0.5Cu/Ni-P joints after laser and reflow soldering and isothermal aging were compared and analyzed. Findings In the as-soldered Sn3.0Ag0.5Cu/Ni-P joints, a small granular and loose (Cu,Ni)6Sn5 intermetallic compound (IMC) structure was formed by laser soldering regardless of the laser energy, and a long and needlelike (Cu,Ni)6Sn5 IMC structure was generated by reflow soldering. During aging at 150°C, the growth rate of the IMC layer was faster by laser soldering than by reflow soldering. The shear strength of as-soldered joints for reflow soldering was similar to that of laser soldering with 7.5 mJ, which sharply decreased from 0 to 100 h for both cases and then was maintained at a similar level with increasing aging time. Originality/value Laser soldering with certain energy is effective for reducing the thickness of IMCs, and ensuring the mechanical property of the joints was similar to reflow soldering.
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激光与回流焊Sn-Ag-Cu/Ni-P接头固-固界面反应及焊接性能的对比研究
目的与回流焊相比,激光焊接由于其局部和非接触加热、温度快速上升和下降、无焊剂且易于自动化,作为微焊接的替代焊接工艺而备受关注。设计/方法/方法在本研究中,对Sn3.0Ag0.5Cu/Ni-P接头在激光和回流焊以及等温时效后的冶金和力学性能进行了比较和分析。结果在Sn3.0Ag0.5Cu/Ni-P焊接接头中,无论激光能量如何,都能通过激光焊接形成小颗粒、疏松的(Cu,Ni)6Sn5金属间化合物(IMC)结构,并通过回流焊接形成长针状的(Cu、Ni)6Sn 5 IMC结构。在150°C的老化过程中,激光焊接的IMC层的生长速度比回流焊接更快。回流焊的钎焊接头的剪切强度与7.5mJ的激光焊接接头相似,从0急剧下降到100 h,然后随着老化时间的增加保持在相似的水平。独创性/价值具有一定能量的激光焊接可以有效地减少IMC的厚度,并确保接头的机械性能类似于回流焊。
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来源期刊
Microelectronics International
Microelectronics International 工程技术-材料科学:综合
CiteScore
1.90
自引率
9.10%
发文量
28
审稿时长
>12 weeks
期刊介绍: Microelectronics International provides an authoritative, international and independent forum for the critical evaluation and dissemination of research and development, applications, processes and current practices relating to advanced packaging, micro-circuit engineering, interconnection, semiconductor technology and systems engineering. It represents a current, comprehensive and practical information tool. The Editor, Dr John Atkinson, welcomes contributions to the journal including technical papers, research papers, case studies and review papers for publication. Please view the Author Guidelines for further details. Microelectronics International comprises a multi-disciplinary study of the key technologies and related issues associated with the design, manufacture, assembly and various applications of miniaturized electronic devices and advanced packages. Among the broad range of topics covered are: • Advanced packaging • Ceramics • Chip attachment • Chip on board (COB) • Chip scale packaging • Flexible substrates • MEMS • Micro-circuit technology • Microelectronic materials • Multichip modules (MCMs) • Organic/polymer electronics • Printed electronics • Semiconductor technology • Solid state sensors • Thermal management • Thick/thin film technology • Wafer scale processing.
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