Optical properties of pulsed dc magnetron sputtered thin film tantalum nitride by spectroscopic ellipsometry

IF 1.6 Q3 PHYSICS, CONDENSED MATTER Surface Science Spectra Pub Date : 2023-06-01 DOI:10.1116/6.0002441
Bishal Shrestha, S. Jaszewski, J. Ihlefeld, S. Wolfley, M. David Henry, N. Podraza
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Abstract

Ellipsometric spectra of polycrystalline thin film tantalum nitride (TaN) have been collected and analyzed to obtain the complex dielectric function (ɛ = ɛ1 + iɛ2) and complex refractive index (N = n + ik) spectra over the photon energy range of 0.059–8.500 eV. Complex optical properties are obtained for TaN in the as-deposited state and rapid thermal annealed at 750 °C for 30 s post deposition. A parametric expression including the contribution from intraband and interband transitions along with a structural model is used and fitted to experimental ellipsometric spectra using iterative least-square regression, which minimizes the unweighted error function or mean square error to extract complex optical properties. The parametric expression developed in this work is successful in describing and differentiating the optical response of measured as-deposited and annealed TaN films and can potentially be used to analyze the optical properties of similar TaN films regardless of their deposition techniques.
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脉冲直流磁控溅射氮化钽薄膜的光学特性
对多晶氮化钽薄膜(TaN)在光子能量为0.059 ~ 8.500 eV范围内的复介电函数(ε = ε 1 + ε 2)和复折射率(N = N + k)光谱进行了采集和分析。TaN在沉积状态下获得了复杂的光学性质,并在沉积后750°C快速热退火30 s。使用包含带内和带间跃迁贡献的参数表达式以及结构模型,并使用迭代最小二乘回归拟合实验椭偏光谱,从而最小化未加权误差函数或均方误差以提取复杂光学特性。在这项工作中开发的参数表达式成功地描述和区分了测量的沉积态和退火态TaN薄膜的光学响应,并且可以潜在地用于分析类似TaN薄膜的光学特性,而不管其沉积技术如何。
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来源期刊
Surface Science Spectra
Surface Science Spectra PHYSICS, CONDENSED MATTER-
CiteScore
1.90
自引率
7.70%
发文量
36
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