{"title":"Real-time contact angle’s measurement of molten solder balls in laboratory conditions","authors":"Daniel Dzivý, A. Pietrikova","doi":"10.1108/mi-12-2021-0122","DOIUrl":null,"url":null,"abstract":"\nPurpose\nThe purpose of this paper is to show a possibility to measure a change of a contact angle during the melting in real-time and to reveal significant factors of a wettability. Influence of the flux with combination of plasma on copper surface was investigated in experiment as well.\n\n\nDesign/methodology/approach\nLaboratory equipment consists of heating and optical part that was developed and tested for real-time contact angle’s measurements. Solder balls based on Sn96.5/Ag3/Cu0.5 and Sn63Pb37 spread out on a copper substrate during a melting process. The wettability of pure copper surface was compared with copper surface treated with flux or combination plasma–flux. The contact angle and spreading rate of a melted solder balls observed by the charged-coupled device camera were analyzed in real-time and measured using the JavaScript.\n\n\nFindings\nLaboratory equipment allows for analysis of contact angle and spreading rate in real-time during the melting process. The contact angle decreases more noticeable after applying the plasma-flux treatment in contrast to no flux or flux treatment only. Using the plasma treatment before application of the flux improves the wettability and the effectivity of the flux activity on the copper surface during the melting process.\n\n\nOriginality/value\nThe interpretation of the results of such a comprehensive measurement leads to a better understanding of the mutual relation between flux and combination plasma–flux of the wetting during the melting process. The simple, cheap, fast and accurate laboratory equipment, which consists of the heating and the optical part, allows for the wettability evaluation of the melting process in real-time.\n","PeriodicalId":49817,"journal":{"name":"Microelectronics International","volume":" ","pages":""},"PeriodicalIF":0.7000,"publicationDate":"2022-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics International","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1108/mi-12-2021-0122","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 1
Abstract
Purpose
The purpose of this paper is to show a possibility to measure a change of a contact angle during the melting in real-time and to reveal significant factors of a wettability. Influence of the flux with combination of plasma on copper surface was investigated in experiment as well.
Design/methodology/approach
Laboratory equipment consists of heating and optical part that was developed and tested for real-time contact angle’s measurements. Solder balls based on Sn96.5/Ag3/Cu0.5 and Sn63Pb37 spread out on a copper substrate during a melting process. The wettability of pure copper surface was compared with copper surface treated with flux or combination plasma–flux. The contact angle and spreading rate of a melted solder balls observed by the charged-coupled device camera were analyzed in real-time and measured using the JavaScript.
Findings
Laboratory equipment allows for analysis of contact angle and spreading rate in real-time during the melting process. The contact angle decreases more noticeable after applying the plasma-flux treatment in contrast to no flux or flux treatment only. Using the plasma treatment before application of the flux improves the wettability and the effectivity of the flux activity on the copper surface during the melting process.
Originality/value
The interpretation of the results of such a comprehensive measurement leads to a better understanding of the mutual relation between flux and combination plasma–flux of the wetting during the melting process. The simple, cheap, fast and accurate laboratory equipment, which consists of the heating and the optical part, allows for the wettability evaluation of the melting process in real-time.
期刊介绍:
Microelectronics International provides an authoritative, international and independent forum for the critical evaluation and dissemination of research and development, applications, processes and current practices relating to advanced packaging, micro-circuit engineering, interconnection, semiconductor technology and systems engineering. It represents a current, comprehensive and practical information tool. The Editor, Dr John Atkinson, welcomes contributions to the journal including technical papers, research papers, case studies and review papers for publication. Please view the Author Guidelines for further details.
Microelectronics International comprises a multi-disciplinary study of the key technologies and related issues associated with the design, manufacture, assembly and various applications of miniaturized electronic devices and advanced packages. Among the broad range of topics covered are:
• Advanced packaging
• Ceramics
• Chip attachment
• Chip on board (COB)
• Chip scale packaging
• Flexible substrates
• MEMS
• Micro-circuit technology
• Microelectronic materials
• Multichip modules (MCMs)
• Organic/polymer electronics
• Printed electronics
• Semiconductor technology
• Solid state sensors
• Thermal management
• Thick/thin film technology
• Wafer scale processing.