{"title":"Micro‐Machining of PZT‐Based MEMS","authors":"Todd Myers, S. Bose, A. Bandyopadhyay, J. Fraser","doi":"10.1002/9781118370872.CH16","DOIUrl":null,"url":null,"abstract":"PZT thin films, prepared on platinized silicon wafers using a sol-gel technique, were micromachined to create structures for MEMS devices. Standard photolithography techniques were used to create structures in silicon and a silicon substrate using a PZT thin film.","PeriodicalId":7486,"journal":{"name":"American Ceramic Society Bulletin","volume":"129 ","pages":"187-197"},"PeriodicalIF":0.5000,"publicationDate":"2012-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"American Ceramic Society Bulletin","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/9781118370872.CH16","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
引用次数: 4
Abstract
PZT thin films, prepared on platinized silicon wafers using a sol-gel technique, were micromachined to create structures for MEMS devices. Standard photolithography techniques were used to create structures in silicon and a silicon substrate using a PZT thin film.
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