FinFETs: From Devices to Architectures

Q3 Engineering Advances in Optoelectronics Pub Date : 2014-09-07 DOI:10.1017/CBO9781316156148.003
D. Bhattacharya, N. Jha
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引用次数: 166

Abstract

Since Moore’s law driven scaling of planar MOSFETs faces formidable challenges in the nanometer regime, FinFETs and Trigate FETs have emerged as their successors. Owing to the presence of multiple (two/three) gates, FinFETs/Trigate FETs are able to tackle short-channel effects (SCEs) better than conventional planar MOSFETs at deeply scaled technology nodes and thus enable continued transistor scaling. In this paper, we review research on FinFETs from the bottommost device level to the topmost architecture level. We survey different types of FinFETs, various possible FinFET asymmetries and their impact, and novel logic-level and architecture-level tradeoffs offered by FinFETs. We also review analysis and optimization tools that are available for characterizing FinFET devices, circuits, and architectures.
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finfet:从器件到架构
由于摩尔定律驱动的平面mosfet的缩放在纳米领域面临着巨大的挑战,finfet和Trigate fet已经成为它们的继任者。由于存在多个(两个/三个)栅极,finfet /Trigate fet能够在深度缩放技术节点上比传统的平面mosfet更好地解决短通道效应(sce),从而实现持续的晶体管缩放。在本文中,我们回顾了finfet的研究,从最底层的器件级到最顶层的架构级。我们调查了不同类型的FinFET,各种可能的FinFET不对称及其影响,以及FinFET提供的新的逻辑级和架构级权衡。我们还回顾了可用于表征FinFET器件、电路和架构的分析和优化工具。
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来源期刊
Advances in Optoelectronics
Advances in Optoelectronics ENGINEERING, ELECTRICAL & ELECTRONIC-
CiteScore
1.30
自引率
0.00%
发文量
0
期刊介绍: Advances in OptoElectronics is a peer-reviewed, open access journal that publishes original research articles as well as review articles in all areas of optoelectronics.
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