{"title":"A Comparative Performance Analysis of 6T & 9T SRAM Integrated Circuits: SOI vs. Bulk","authors":"Qazi Mashaal Khan;Richard Perdriau;Mohamed Ramdani;Mohsen Koohestani","doi":"10.1109/LEMCPA.2022.3163963","DOIUrl":null,"url":null,"abstract":"This letter evaluates the performance of 6T & 9T static random access memory (SRAM) cells, for data stability and power metrics, with the aim to compare silicon-on-insulator (SOI) and bulk CMOS technologies. Each SRAM topology was designed & simulated in 180 nm 5 V XFAB-SOI and AMS-bulk processes, using optimized parameters and compatible devices. The fundamental variables analyzed were read noise margins, write trip current & voltage as well as leakage current (LC) and static power dissipation (SPD) under process and temperature (PT) variations. The static noise margin (SNM) butterfly curve and N-curve methodologies were used to assess the mentioned parameters. Compared to bulk technology, the SRAM cells designed with SOI were found to have lower SPD & LC, higher data stability, lower write ability, larger sensitivity to process variations and higher resilience to temperature deviations.","PeriodicalId":100625,"journal":{"name":"IEEE Letters on Electromagnetic Compatibility Practice and Applications","volume":"4 2","pages":"25-30"},"PeriodicalIF":1.0000,"publicationDate":"2022-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Letters on Electromagnetic Compatibility Practice and Applications","FirstCategoryId":"1085","ListUrlMain":"https://ieeexplore.ieee.org/document/9747925/","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 3
Abstract
This letter evaluates the performance of 6T & 9T static random access memory (SRAM) cells, for data stability and power metrics, with the aim to compare silicon-on-insulator (SOI) and bulk CMOS technologies. Each SRAM topology was designed & simulated in 180 nm 5 V XFAB-SOI and AMS-bulk processes, using optimized parameters and compatible devices. The fundamental variables analyzed were read noise margins, write trip current & voltage as well as leakage current (LC) and static power dissipation (SPD) under process and temperature (PT) variations. The static noise margin (SNM) butterfly curve and N-curve methodologies were used to assess the mentioned parameters. Compared to bulk technology, the SRAM cells designed with SOI were found to have lower SPD & LC, higher data stability, lower write ability, larger sensitivity to process variations and higher resilience to temperature deviations.
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