S. Rekha, S. Jothilakshmi, A. Kalicharan, R. Ranjani
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引用次数: 0
Abstract
The inhibition efficiency of various stabilizers and the enhancing behavior of accelerators were studied by gravimetric analysis in electroless copper plating which is quite in need for industrial applications like electronics industries, very large-scale industries, oil, and textile field. The effect of temperature ranging from 303 K to 343 K could be understood from the Arrhenius plot. The activation energy (Ea) for the stabilizers employed showed a higher value in comparison with blank baths, thus exhibiting the inhibition property of the stabilizers. In a similar way, the accelerators possess higher activation energy for monocarboxylic acid than di and tricarboxylic acids. The trend obtained in the Arrhenius plot correlates well with Tafel polarization studies.
期刊介绍：
RASĀYAN Journal of Chemistry [RJC] signifies a confluence of diverse streams of chemistry to stir up the cerebral powers of its contributors and readers. By introducing the journal by this name, we humbly intent to provide an open platform to all researchers, academicians and readers to showcase their ideas and research findings among the people of their own fraternity and to share their vast repository of knowledge and information. The journal seeks to embody the spirit of enquiry and innovation to augment the richness of existing chemistry literature and theories. We also aim towards making this journal an unparalleled reservoir of information and in process aspire to inculcate and expand the research aptitude.
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