符媛英 Fu Yuanying, 李艳秋 Li Yanqiu, 刘晓林 Liu Xiaolin, 曹. C. Zhen, 刘. L. Ke
{"title":"A method of tolerance analysis for wavefront error of lithographic projection lens","authors":"符媛英 Fu Yuanying, 李艳秋 Li Yanqiu, 刘晓林 Liu Xiaolin, 曹. C. Zhen, 刘. L. Ke","doi":"10.3788/GXJS20144004.0289","DOIUrl":null,"url":null,"abstract":"A simple and reliable method of tolerance analysis is proposed to ensure the performance of lithographic projection lens and minimize the manufacturing costs of lithographic projection lens.This method defines P-V wavefront error as merit function based on RMS wavefront error,and selects the optimal compensators.Compared to present methods,this method decreases mechanical complexity and minimizes the manufacturing costs by adopting less compensators,with both RMS wavefront error and P-V wavefront error achieving the requirement.As an example the method is applied to a refractive projection lens for 90nm resolution lithography projection lens designed by us.The results show that,only with 7compensators,RMS wavefront error and P-V wavefront error at 97.7%probability are less than 0.0412λand 0.2469λ,respectively.In conclusion,this method is able to meet the performance requirement of lithographic projection lens.","PeriodicalId":35591,"journal":{"name":"光学技术","volume":"41 1","pages":"289-294"},"PeriodicalIF":0.0000,"publicationDate":"2014-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"光学技术","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.3788/GXJS20144004.0289","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Physics and Astronomy","Score":null,"Total":0}
引用次数: 2
Abstract
A simple and reliable method of tolerance analysis is proposed to ensure the performance of lithographic projection lens and minimize the manufacturing costs of lithographic projection lens.This method defines P-V wavefront error as merit function based on RMS wavefront error,and selects the optimal compensators.Compared to present methods,this method decreases mechanical complexity and minimizes the manufacturing costs by adopting less compensators,with both RMS wavefront error and P-V wavefront error achieving the requirement.As an example the method is applied to a refractive projection lens for 90nm resolution lithography projection lens designed by us.The results show that,only with 7compensators,RMS wavefront error and P-V wavefront error at 97.7%probability are less than 0.0412λand 0.2469λ,respectively.In conclusion,this method is able to meet the performance requirement of lithographic projection lens.
光学技术Physics and Astronomy-Atomic and Molecular Physics, and Optics
CiteScore
0.60
自引率
0.00%
发文量
6699
期刊介绍：
The predecessor of Optical Technology was Optical Technology, which was founded in 1975. At that time, the Fifth Ministry of Machine Building entrusted the School of Optoelectronics of Beijing Institute of Technology to publish the journal, and it was officially approved by the State Administration of Press, Publication, Radio, Film and Television for external distribution. From 1975 to 1979, the magazine was named Optical Technology, a quarterly with 4 issues per year; from 1980 to the present, the magazine is named Optical Technology, a bimonthly with 6 issues per year, published on the 20th of odd months.
The publication policy is: to serve the national economic construction, implement the development of the national economy, serve production and scientific research, and implement the publication policy of "letting a hundred flowers bloom and a hundred schools of thought contend".
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
