Etching of oxide semiconductors by ultrashort laser pulses

D. Ruthe, K. Zimmer
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Abstract

In this paper the etching and structuring of zinc oxide, indium tin oxide by ultrashort laser pulses is analysed. A Ti:sapphire laser, which provides 120 fs pulses at a wavelength of 775 nm, was used to etch the samples at room temperature in air as well as in vacuum. The surface topography of the etched semiconductors has been investigated.
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用超短激光脉冲刻蚀氧化物半导体
本文分析了超短激光脉冲对氧化锌、氧化铟锡的刻蚀和结构的影响。采用Ti:蓝宝石激光器,在775 nm波长下提供120fs脉冲,在室温和真空条件下对样品进行蚀刻。对蚀刻半导体的表面形貌进行了研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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