What can we learn from the saturation of light-induced defects in amorphous hydrogenated silicon?

M. Isomura, X. Xu, S. Wagner
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引用次数: 15

Abstract

At a sufficiently high photon flux the density of light-induced defects in amorphous hydrogenated silicon (a-Si:H) can be made to saturate within a few hours. The saturated defect density Nsat is independent of light intensity, of temperature and of further illumination over a wide range of conditions. Therefore, Nsat can serve as a robust criterion for the rapid evaluation of the stability of a-Si:H. In this paper we show that Nsat is correlated with the rate of defect buildup during light-soaking, so that the entire defect history and the useful life of a particular sample may be inferred from Nsat. So far, we have measured values of Nsat between 4 × 1016 and 2 × 1017 cm−3 in electronic-grade a-Si:H. Nsat, and thus the rate of defect buildup, rises with the value of the band gap and with the hydrogen content; it drops with increasing deposition temperature. Nsat is not correlated with either the initial defect density or the Urbach energy. We demonstrate an application of the correlation between the saturated defect density and the optical gap to predict the long-term performance of solar cells.

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我们可以从非晶氢化硅的光致缺陷饱和中学到什么?
在足够高的光子通量下,可使非晶氢化硅(a- si:H)的光致缺陷密度在数小时内达到饱和。饱和缺陷密度Nsat与光强度、温度和在各种条件下的进一步照明无关。因此,Nsat可以作为快速评价a- si:H稳定性的可靠标准。在本文中,我们证明了Nsat与光浸泡过程中缺陷积累的速度相关,因此可以从Nsat推断出特定样品的整个缺陷历史和使用寿命。到目前为止,我们已经测量到电子级a-Si:H的Nsat值在4 × 1016和2 × 1017 cm−3之间。Nsat,也就是缺陷形成的速率,随着带隙的增大和含氢量的增加而增加;它随着沉积温度的升高而降低。Nsat与初始缺陷密度和乌尔巴赫能量无关。我们展示了饱和缺陷密度和光隙之间的相关性的应用,以预测太阳能电池的长期性能。
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