Potential fluctuations, diffusion length and lateral photovoltage in hydrogenated amorphous silicon and silicon–germanium thin films

A. Srivastava, S. Agarwal
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引用次数: 3

Abstract

Abstract The lateral photovoltage (LPV) has been measured between coplanar electrodes by illuminating hydrogenated amorphous silicon samples at various positions with a red laser spot. We find that the LPV decreases at higher temperatures and increases upon light soaking. Similar results are obtained for hydrogenated amorphous silicon–germanium alloys. The diffusion length of carriers in our samples is measured by the steady-state photocarrier grating technique and the LPV is calculated. The calculated LPV is much smaller than that experimentally measured. We propose that the potential fluctuations present in the samples might be responsible for the large LPV. We have measured the ambipolar diffusion lengths in a-Si : H and a-SiGe : H samples by the SSPG technique. The ambipolar diffusion length decreases with increasing germanium incorporation in the films while keeping the other deposition parameters the same. This decrease in the ambipolar diffusion length with increasing germanium incorporation is attributed to the increase in the DOS as evident from our CPM measurements. Moreover, for all the samples studied, we found that the diffusion length decreases with LS and this is also explained on the basis of the rise in the DOS. These findings are as expected and are in agreement with the published results (Ritter et al. 1987, Weiser and Ritter 1989, Sakata et al. 1997). A LPV is observed in all the samples studied. The LPV decreases upon increasing the temperature of measurement but increases upon LS. In all cases the magnitude of the LPV is found to be much larger than expected from the measured L. The observations are explained on the basis of the potential fluctuations present in the material. These arise from the heterogeneities, that is non-uniform distribution of hydrogen and variation in silicon and germanium concentrations from point to point in the a-SiGe: H film. In our model, the effect of these potential fluctuations is twofold. The electrons and holes become separated spatially in the presence of the potential fluctuations. This tends to reduce their recombination probability and might increase L. Secondly, there is an accumulation of localized charges in the states that coexist above the percolation edge with the extended states. Although these charges do not participate in conduction, they will give a contribution to the LPV. Other factors, for example band bending at the surface might also contribute by separating the carriers. Hence larger potential fluctuations are likely to give a large LPV, since both N and L in equation (14) are expected to be larger. Since the presence of a bias light is expected to reduce the potential fluctuations, the LPV should also be reduced. This explanation of the LPV in terms of potential fluctuations agrees with the observation that the value of L measured by SSPG decreases as the light intensity increases (Weiser and Ritter 1989). Further, we note that SSPG is always carried out in the presence of light and, therefore, is expected to give a smaller L than its value in the dark. In order to test this, we measured the LPV in the presence of bias light and found that the LPV decreases when the bias light is on (see figure 12). The increase in LPV after LS in all the samples can also be explained by this model. Since LS increases the potential fluctuations (Hauschildt et al. 1982, Agarwal 1996, Agarwal et al. 1996), the increase in the LPV is understandable. Thus we can explain all our data by the potential fluctuation model. A more quantitative analysis is not possible at this stage. It is, however, clear that a more heterogeneous sample should show a larger LPV since the potential fluctuations are more. This is an interesting observation which could be useful in comparing the quality of samples prepared under different conditions. This requires more experimentation.
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氢化非晶硅和硅锗薄膜的电位波动、扩散长度和横向光电压
摘要用红色光斑照射氢化非晶硅样品不同位置,测量了共面电极间的横向光电压。我们发现LPV在较高的温度下降低,在光浸泡时增加。氢化非晶硅锗合金也得到了类似的结果。用稳态光载流子光栅技术测量了样品中载流子的扩散长度,并计算了LPV。计算得到的LPV比实验测得的要小得多。我们认为,样品中存在的潜在波动可能是造成LPV大的原因。我们用SSPG技术测量了a-Si: H和a-SiGe: H样品的双极性扩散长度。在保持其他沉积参数不变的情况下,双极扩散长度随锗掺入量的增加而减小。随着锗掺入量的增加,双极扩散长度的减少归因于DOS的增加,这从我们的CPM测量中可以看出。此外,对于所有研究的样品,我们发现扩散长度随着LS的减小而减小,这也可以用DOS的增加来解释。这些发现与预期一致,与已发表的结果一致(Ritter et al. 1987, Weiser and Ritter 1989, Sakata et al. 1997)。在所研究的所有样品中都观察到LPV。LPV随测量温度的升高而减小,随温度的升高而增大。在所有情况下,发现LPV的大小都比从测量的l中预期的要大得多。根据材料中存在的潜在波动来解释观察结果。这是由于a-SiGe: H薄膜的非均匀性,即氢的不均匀分布以及硅和锗浓度在a-SiGe: H薄膜中点到点的变化。在我们的模型中,这些潜在波动的影响是双重的。电子和空穴在存在电位波动的情况下在空间上分离。这往往会降低它们的重组概率,并可能增加l。其次,在与扩展态共存的渗透边缘以上的态中存在局域电荷的积累。虽然这些电荷不参与传导,但它们对LPV有贡献。其他因素,例如表面的带弯曲也可能通过分离载流子而起作用。因此,更大的潜在波动可能会产生更大的LPV,因为方程(14)中的N和L都预计会更大。由于偏光的存在预计会减少潜在的波动,LPV也应该减少。这种从电位波动角度对LPV的解释与SSPG测量的L值随着光强的增加而减小的观察结果一致(Weiser和Ritter 1989)。此外,我们注意到SSPG总是在有光的情况下进行,因此,预计会给出比黑暗中的值更小的L。为了验证这一点,我们测量了偏置光存在时的LPV,发现偏置光打开时LPV减小(见图12)。所有样品在LS后LPV的增加也可以用这个模型来解释。由于LS增加了潜在波动(Hauschildt et al. 1982, Agarwal 1996, Agarwal et al. 1996), LPV的增加是可以理解的。因此,我们可以用势波动模型来解释我们所有的数据。在这个阶段不可能进行更定量的分析。然而,很明显,一个更异质的样本应该显示更大的LPV,因为潜在的波动更大。这是一个有趣的观察结果,可用于比较在不同条件下制备的样品的质量。这需要更多的实验。
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