An analysis of polyharmonic power sources for industrial plasma generators with distributed structure

V. M. Geller, V. Khrustalev, S.A. Chipurnov, S.N. Gorban
{"title":"An analysis of polyharmonic power sources for industrial plasma generators with distributed structure","authors":"V. M. Geller, V. Khrustalev, S.A. Chipurnov, S.N. Gorban","doi":"10.1109/KORUS.2000.866026","DOIUrl":null,"url":null,"abstract":"A volume use efficiency of capacitively and inductively coupled low-pressure plasma generators does not exceed 45-50 %. For example, the most widespread kind of reactors-that is cylindrical-in capacitively coupled plasma generators the excitation of plasma has a place at the center of the reactor, and in inductively coupled plasmas-on periphery. According to told, usage of the inductor and the capacitor of the resonator for connection the RF power source with the reactor we receive an opportunity to maintain a discharge in all volume of the reactor, increasing by this the power efficiency of the plasma generator. Combining a principle of hybrid plasma excitation with multiway discharge excitation with use of the distributed source of energy, one can maintain in the reactor with large linear dimensions a uniform plasma torch.","PeriodicalId":20531,"journal":{"name":"Proceedings KORUS 2000. The 4th Korea-Russia International Symposium On Science and Technology","volume":"116 1","pages":"203-205 vol. 2"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings KORUS 2000. The 4th Korea-Russia International Symposium On Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/KORUS.2000.866026","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

A volume use efficiency of capacitively and inductively coupled low-pressure plasma generators does not exceed 45-50 %. For example, the most widespread kind of reactors-that is cylindrical-in capacitively coupled plasma generators the excitation of plasma has a place at the center of the reactor, and in inductively coupled plasmas-on periphery. According to told, usage of the inductor and the capacitor of the resonator for connection the RF power source with the reactor we receive an opportunity to maintain a discharge in all volume of the reactor, increasing by this the power efficiency of the plasma generator. Combining a principle of hybrid plasma excitation with multiway discharge excitation with use of the distributed source of energy, one can maintain in the reactor with large linear dimensions a uniform plasma torch.
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分布式结构工业等离子体发生器的多谐电源分析
电容和电感耦合低压等离子体发生器的体积利用效率不超过45- 50%。例如,最普遍的一种反应器是圆柱形的,在电容耦合等离子体发生器中,等离子体的激发位于反应器的中心,而在电感耦合等离子体中,等离子体在外围。根据告诉,使用电感器和谐振器的电容器将射频电源与反应器连接,我们有机会在反应器的所有体积中保持放电,从而提高等离子体发生器的功率效率。结合混合等离子体激励与多路放电激励的原理,利用分布式能量源,可以在大线性尺寸的反应器中保持均匀的等离子体炬。
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