TiO2–CU Thin Film Material for Optical Hydrogen Gas Sensor Applications

Joseph Kamau Kamau
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引用次数: 1

Abstract

Purpose: Several scientific researches are underway to investigate the possibility of using various green energies. Hydrogen gas is a candidate of such research, since its use as a fuel in automobiles releases pure water, a recyclable biproduct. But, the leakages of the gas are detrimental to its application due to its low auto ignition energy of 20 μj, wider air flame limit of 4-75 % and high flame velocity of 3.46 ms-1. This study involved fabrication of an optical gas sensor for sensing the leakage levels of hydrogen gas to a surrounding. Methodology: Titanium dioxide thin films of thicknesses 47.7, 56.2, 82.3, 100.4 and 120.5 nm were deposited on both microscope and FTO glass slides using DC magnetron sputtering technique and characterized as primate and annealed at 400 and 500oC. Copper (Cu) catalytic layers of 5.6, 10.2, 17.3 and 21.0 nm were deposited using EDWARDS AUTO 306 Magnetron sputtering system on an optimized 100.4 nm TiO2 sample, annealed at 400oC. Optical properties were deduced from transmittance and absorbance spectra measured using 1800 Shimadzu spectrophotometer in the optimum range of 280-800 nm through simulation. The optical behavior of the films was generated using SCOUT software and analyzed using ORIGIN 9.1 64-bit software. Results: The energy band gap decreased with material thickness from 4.2±0.05 eV for 47.7 nm film to 3.9±0.05 eV for 100.4 nm films. 120.5 nm films showed higher energy gap of 4.0±0.05 eV. Transmittance decreased with increase in thickness probably due to agglomeration of film particles. The energy gap of the 100.4 nm, TiO2 thin films annealed at 400oC was 3.9±0.05 eV. This is a material quality of the anatase phase. The copper surface layer increased absorption in the higher wavelength region. The energy band gaps were reduced from 3.9 to 3.8±0.05 eV with increased coverage. Self-limiting at 17.3 nm copper overlayer realized increased energy gap to 4.1±0.05 eV. A lower energy band gap range of 3.9-3.8±0.05 eV was realized when FTO substrates were used. The transmittance decreased with increased H2 gas concentration. The optical energy gap reduced from 4.1±0.05 eV in 0 ccm to 3.9±0.05 eV in 50 ccm of hydrogen gas concentration. The sensitivity increased from 0.3 % in 0ccm to 3.9 % in 50 ccm hydrogen gas concentration. An average sensitivity of 2.0 % was realized for films fabricated on FTO substrate. This is higher than 1.7 % reported earlier. The material gas sensing potential was done at room temperature. The fabricated sensor material showed higher sensitivity and lower temperature operation and is furthermore, expected to be cheaper and safer Unique Contribution to Theory, Policy and Practices: Though, in order to realize a more portable stand-alone gas sensor, an investigation on an ideal photon type source that incorporates the material is recommended. Further, extension of this study on structure and morphology of the film is essential to understand its sensing behavior.
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用于光学氢气传感器的TiO2-CU薄膜材料
目的:一些科学研究正在进行,以调查使用各种绿色能源的可能性。氢气是这类研究的候选者,因为它作为汽车燃料会释放纯水,一种可回收的双产物。但由于其自燃能量较低,仅为20 μj,空气火焰极限较宽,火焰速度高达3.46 ms-1,因此气体的泄漏不利于其应用。本研究涉及制造一种光学气体传感器,用于检测氢气向周围环境的泄漏水平。方法:采用直流磁控溅射技术将厚度分别为47.7、56.2、82.3、100.4和120.5 nm的二氧化钛薄膜分别沉积在显微镜和FTO玻片上,并进行灵长类表征,在400和500℃下退火。采用EDWARDS AUTO 306磁控溅射系统,在优化后的100.4 nm TiO2样品上沉积了5.6、10.2、17.3和21.0 nm的铜催化层。利用1800 Shimadzu分光光度计在280 ~ 800 nm的最佳范围内测量的透过率和吸光度,通过仿真推导出其光学性能。使用SCOUT软件生成薄膜的光学行为,并使用ORIGIN 9.1 64位软件进行分析。结果:能带隙随材料厚度的增加而减小,从47.7 nm薄膜的4.2±0.05 eV减小到100.4 nm薄膜的3.9±0.05 eV。120.5 nm薄膜的能隙较大,为4.0±0.05 eV。透光率随厚度的增加而降低,这可能是由于薄膜颗粒的聚集。400℃退火后的100.4 nm TiO2薄膜的能隙为3.9±0.05 eV。这是锐钛矿相的一种材料性质。铜表面层增加了高波长区域的吸收。随着覆盖率的增加,能隙从3.9 eV减小到3.8±0.05 eV。在17.3 nm处铜层的自限能使能隙增大到4.1±0.05 eV。使用FTO衬底时,能隙范围较低,为3.9 ~ 3.8±0.05 eV。透过率随氢气浓度的增加而降低。在氢气浓度为0 ccm时,光能隙由4.1±0.05 eV减小到3.9±0.05 eV。灵敏度从0ccm时的0.3%提高到50 ccm时的3.9%。在FTO衬底上制备的薄膜平均灵敏度为2.0%。这比之前报道的1.7%要高。在室温下测定了材料的气敏电位。制造的传感器材料具有更高的灵敏度和更低的温度操作,并且有望更便宜和更安全。对理论,政策和实践的独特贡献:尽管,为了实现更便携式的独立气体传感器,建议对包含该材料的理想光子型源进行研究。此外,进一步研究薄膜的结构和形态对理解其传感行为至关重要。
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