Study of Al/a-SiC/c-Si(p)/Al structure prepared by PECVD

M. Váry, J. Huran, M. Perný, M. Mikolasek, V. Šály, J. Packa, A. Kobzev
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Abstract

The heterojunction structure which consists of amorphous SiC layer deposited on p-type silicon substrate was prepared at various substrate temperatures and studied to optimize the technology and improve the quality of the interface. Rutherford Backscattering Spectroscopy (RBS) and Elastic Recoil Detection (ERD) structural analysis was employed in determination the concentrations of elements. Current-voltage (I-V) measurements were processed in order to obtained basic electric and PV parameters of prepared samples. Biased impedance spectra of Al/a-SiC/c-Si(p)/Al heterojunction in the dark are reported and analyzed. AC measurements in the dark conditions were processed in order to identify electronic behavior using equivalent AC circuit which was suggested and obtained by fitting of measured impedance data. A phenomenon of negative capacitance/resistance in certain frequency range has been observed.
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PECVD制备Al/a-SiC/c-Si(p)/Al结构的研究
在不同的衬底温度下,制备了沉积在p型硅衬底上的非晶SiC层异质结结构,并对其工艺进行了优化,提高了界面质量。采用卢瑟福后向散射光谱(RBS)和弹性反冲检测(ERD)结构分析方法测定元素的浓度。为了得到制备样品的基本电参数和PV参数,对电流-电压(I-V)进行了测量。报道并分析了Al/a-SiC/c-Si(p)/Al异质结在黑暗中的偏置阻抗谱。在黑暗条件下的交流测量,为了识别电子行为,使用等效交流电路,这是由拟合测量阻抗数据得到的。在一定频率范围内观察到负电容/负电阻现象。
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