Adsorption and Photocatalytic Removal of Arsenic from Water by a Porous and Magnetic Nanocomposite: Ag/TiO2/Fe3O4@GO

M. Miranzadeh, F. Afshari, Behnoosh Khataei, M. Kassaee
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引用次数: 5

Abstract

As (III) regularly requires oxidation to As (V), before it can be removed from water. Here, we reported photocatalytic removal of As (III) as well as adsorption of As (III) and As (V) using a novel, porous magnetic Ag/TiO2/Fe3O4@GO nanocomposite which was characterized via FT-IR, XRD, SEM, and TEM. A mathematical model (the central composite design) was used to estimate the relationship between the observed adsorption and our set of variables including initial concentration of arsenic ions, adsorbent dosage, pH, and the contact time. An optimum adsorption capacity of about 91% was observed for As (III) using 20 mg adsorbent with 24 ppm initial concentration of As (III), at pH = 5, within 90 min, and room temperature. Likewise, an optimum adsorption capacity of about 87% was observed for As (V) using 11 mg adsorbent with 17 ppm initial concentration of As (V), at pH = 3, within 30 min, and room temperature. The electrostatic factors between surface charge of nanocomposite and arsenic species were used to explain adsorption behavior of As (III) and As (V) at different conditions. The Langmuir isotherm equations best interpreted the nature of adsorption of As (III) and A (V). It was found during phocatalytic process maximum R% was about 63% for As (III) using 40 mg photocatalyst.
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Ag/TiO2/Fe3O4@GO多孔磁性纳米复合材料对水中砷的吸附及光催化去除
As (III)通常需要氧化成As (V),才能从水中除去。本文报道了一种新型多孔磁性Ag/TiO2/Fe3O4@GO纳米复合材料对As (III)的光催化去除以及As (III)和As (V)的吸附,并通过FT-IR、XRD、SEM和TEM进行了表征。使用数学模型(中心复合设计)来估计观察到的吸附与我们的一组变量之间的关系,这些变量包括砷离子的初始浓度、吸附剂剂量、pH和接触时间。在pH = 5、室温条件下,当吸附剂浓度为20 mg、初始浓度为24 ppm、吸附时间为90 min时,对As (III)的最佳吸附量约为91%。同样,当初始As (V)浓度为17 ppm、pH = 3、30 min、室温条件下,吸附剂浓度为11 mg时,对As (V)的最佳吸附量约为87%。利用纳米复合材料表面电荷与砷之间的静电因子来解释不同条件下As (III)和As (V)的吸附行为。Langmuir等温线方程很好地解释了As (III)和A (V)的吸附性质。在40 mg光催化剂的光催化过程中,As (III)的最大R%约为63%。
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