Grain growth kinetics and its effect on instrumented indentation response to nanocrystalline Ni

A. Chatterjee, G. Sharma, J. Chakravartty
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Abstract

Thermal instability in nanocrystalline (nc) Ni with a grain size of ∼60 nm was studied in detail. The kinetics of thermal grain growth behavior was studied by DSC and resistivity experiments. Thermal instability was characterized by determining the activation energy required for grain growth in the temperature range of 100-400 °C. The activation energy was found to be ∼ 100 kJ/mol below Curie temperature and ∼ 298 kJ/mol above Curie temperature. The effect of grain size on hardness and activation volume was investigated using nanoindentation technique. The interaction of dislocations-grain boundaries mediated mechanism was found to be the rate controlling plastic deformation mechanism.
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晶粒生长动力学及其对纳米晶Ni压痕响应的影响
详细研究了粒径为~ 60 nm的纳米晶(nc) Ni的热不稳定性。通过DSC和电阻率实验研究了晶粒的热生长动力学。通过测定在100-400℃温度范围内晶粒生长所需的活化能来表征热不稳定性。在居里温度以下的活化能为~ 100 kJ/mol,在居里温度以上的活化能为~ 298 kJ/mol。采用纳米压痕技术研究了晶粒尺寸对硬度和活化体积的影响。发现位错-晶界相互作用是控制塑性变形速率的机制。
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