Microfabricated SOI pressure sensor using dynamically balanced lateral resonator

Sen Ren, W. Yuan, Xiaodong Sun, Jinjun Deng, D. Qiao, C. Jiang
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引用次数: 3

Abstract

A resonant pressure sensor using a dynamically balanced lateral resonator is presented, which employs differential electrostatic comb structure for linear driving and sensing. The sensor is successfully microfabricated through a simple yet reliable micromachining process based on a commercially available silicon-on-insulator wafer with only two masks. Special anchor structure is developed to suppress the vertical position shift of the resonator when the diaphragm deflects, which using suspended connecting trusses to attach the stress-sensitive beam ends of the resonator. The sensor chip is mounted into a custom 16-pin Kovar package with epoxy resin for preliminary measurements. Testing results show that the resonator has a fundamental resonant frequency of 34.17 kHz, and the quality factor is about 1253 at atmospheric pressure, which rises to above 50 000 below 5 Pa. Over the pressure range of 100-380 kPa, the static pressure sensitivity is approximately 10.17 Hz/kPa, with the nonlinearity of 0.02%FS, the hysteresis error of 0.05%FS, and the repeatability error of 0.17%FS.
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采用动态平衡横向谐振器的微加工SOI压力传感器
提出了一种采用动平衡横向谐振腔的谐振式压力传感器,该传感器采用差分静电梳状结构进行线性驱动和传感。该传感器是通过简单而可靠的微加工工艺成功微制造的,该工艺基于市售的只有两个掩模的绝缘体上硅晶圆。为了抑制谐振器在膜片偏转时的垂直位置位移,设计了特殊的锚固结构,采用悬挂式连接桁架固定在谐振器的应力敏感梁两端。传感器芯片安装在一个定制的16针Kovar封装与环氧树脂进行初步测量。测试结果表明,该谐振器的基频为34.17 kHz,在常压下的质量因数约为1253,在5 Pa以下的质量因数可达50 000以上。在100 ~ 380 kPa的压力范围内,静压灵敏度约为10.17 Hz/kPa,非线性为0.02%FS,滞后误差为0.05%FS,重复性误差为0.17%FS。
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