Recent development on the modeling of electrical contact

Peng Zhang, Y. Lau
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Abstract

Summary form only given. Electrical contact is an important issue to high power microwave sources, pulsed power systems, field emitters, thin film devices and integrated circuits, and interconnects, etc. Current crowding, which leads to intense local heating, is a well known phenomenon associated with contact resistance for the above areas. This paper summarizes recent development on the accurate evaluation of contact resistance for both horizontal [1-3] and vertical [3,4] contacts. By horizontal (vertical), we mean a current flow that is parallel (perpendicular) to the base of a contact member. The contact members may possess vastly different electrical resistivities, and arbitrary aspect ratios. The analytic calculations are validated by the MAXWELL codes. Current partitions in different regions are displayed. Current crowding is shown to occur within a distance of 0.44h of the rim of an electrode that is made in horizontal contact with a thin film of thickness h, regardless of the electrode shape [1,3]. A novel relation between AC bulk contact resistance and DC thin film contact resistance was discovered [3]. General scaling laws are presented.
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电接触建模的最新进展
只提供摘要形式。电接触是大功率微波源、脉冲电源系统、场发射器、薄膜器件和集成电路、互连等领域的一个重要问题。电流拥挤,导致强烈的局部加热,是一种众所周知的现象,与上述区域的接触电阻有关。本文综述了水平[1-3]和垂直[3,4]接触电阻精确评估的最新进展。所谓水平(垂直),我们指的是与触点构件底部平行(垂直)的电流。接触元件可能具有截然不同的电阻率和任意宽高比。通过MAXWELL程序验证了解析计算的正确性。显示不同区域的当前分区。无论电极形状如何,当电极与厚度为h的薄膜水平接触时,在距离电极边缘0.44h的距离内都会出现电流拥挤现象[1,3]。发现了交流体接触电阻与直流薄膜接触电阻之间的新关系[3]。给出了一般的标度定律。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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