Fluorite-structure antiferroelectrics

Abstract

Ferroelectricity in fluorite-structure oxides like hafnia and zirconia have attracted increasing interest since 2011. Two spontaneous polarizations of the fluorite-structure ferroelectrics are considered highly promising for nonvolatile memory applications, with their superior scalability and Si compatibility compared to the conventional perovskite-structure ferroelectrics. Besides, antiferroelectricity originating from a field-induced phase transition between the paraelectric and ferroelectric phases in fluorite-structure oxides is another highly interesting matter. It was suggested that the field-induced phase transition could be utilized for energy conversions between thermal and electrical energy, as well as for energy storage. The important energy-related applications of antiferroelectric fluorite-structure oxides, however, have not been systematically reviewed to date. Thus, in this work, the fluorite-structure antiferroelectrics are reviewed from their fundamentals to their applications based on pyroelectricity as well as antiferroelectricity. Another important application field of the fluorite-structure antiferroelectrics is the semiconductor memory devices. The fluorite-structure antiferroelectrics can be utilized for antiferroelectric random-access-memories, negative capacitance field-effect-transistors, and flash memories. Moreover, the recently reported morphotropic phase boundary (MPB) between the ferroelectric and antiferroelectric phases in this material system marks another significant progress in this material system, and thus, the fundamentals and applications of the MPB phase are also reviewed.