Transparent mask design and fabrication of interdigitated electrodes

Abstract

Fabrication of Interdigitated Electrodes (IDEs) involves several processes which include oxidation, metallization and photolithography. Among these three processes, photolithography process is the most critical part in the fabrication of IDEs. Photolithography refers to the process of pattern definition by transferring the desired design patterns from a photo-mask/chrome-mask to photoresist (thin uniform layer of viscous liquid) on the wafer surface. Thus, printed transparent masks' resolution plays an important role in photolithography process. This will affect the dimension of pattern transfer to the photoresist and hence influences the functionality of IDEs indirectly due to the low resolution of the printed mask. Consequently, the dimension of IDEs' design is compared among the design in AutoCAD tool, printed mask and fabricated device.