Influence of Deposition Parameters on the Structure of TiO2 Thin Films Prepared by Reactive Magnetron Sputtering Technique

Vytautas Kavaliūnas, Audrone Sestakauskaite, Mantas Sriubas, G. Laukaitis
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沉积参数对反应磁控溅射法制备TiO2薄膜结构的影响
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