Study chemical reaction of –Si–OH surface layer by solid and ionic form to surface quality when polishing with chemical–mechanical slurry

Le Anh Duc , Pham Minh Hieu , Nguyen Minh Quang
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Abstract

The yttrium aluminium garnet (YAG) and sapphire materials are commonly used in laser and optical devices. Producing an ultra-precise surface quality is necessary for the application in optical devices. However, YAG and sapphire materials belong to difficult-to-machine materials with high brittleness and hardness. Therefore, ensuring the main criterion of producing a quality surface in the nanometre form with the ability to remove the material when finishing this material is challenging. Eliminating machining residues using chemical–mechanical slurry (CMS) is essential in creating ultra-precise components in optical devices. Based on this feature, this work investigates the efficiency of the CMS polishing process by comparing the surface reaction modes with the ionic and solid reaction modes when polishing YAG and sapphire materials. The study procedures aim to clarify the polishing performance corresponding to these two reaction types. Experimental analyses show the balance between CMS polishing technology’s mechanical and chemical effects with the ionic reaction model that can be generated. Results also show that the ionic surface reaction modes give more uniform material removal than the solid reaction on YAG and sapphire crystal surfaces. Therefore, when polished by CMS technology with ionic surface reaction modes, the surface quality is better than solid reaction. In the CMS polishing with ionic responses, adding more Na2SiO3–5H2O content to the CMS is necessary if the chemical reaction is weak. This process will facilitate the –Si–OH components to be more distributed on the workpiece’s surface, thereby improving reaction speed and correcting the balance between mechanical and chemical in polishing by CMS. This balance action results in an ultra-smooth YAG crystal surface without scratches, with a roughness obtained in the nanometre form (Ra = 1.031 nm) after polishing by CMS-2.

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研究化学机械研磨浆抛光时,固态和离子形态的 -Si-OH 表层化学反应对表面质量的影响
钇铝石榴石(YAG)和蓝宝石材料常用于激光和光学设备中。要应用于光学设备,就必须获得超精密的表面质量。然而,YAG 和蓝宝石材料属于难加工材料,具有高脆性和高硬度。因此,在对这种材料进行精加工时,既要确保纳米级的表面质量,又要能去除材料,这是一项具有挑战性的主要标准。使用化学机械浆料(CMS)消除加工残留物对于制造光学设备中的超精密部件至关重要。基于这一特点,本研究通过比较 YAG 和蓝宝石材料抛光时的表面反应模式与离子和固体反应模式,研究了 CMS 抛光过程的效率。研究程序旨在明确这两种反应类型对应的抛光性能。实验分析表明了 CMS 抛光技术的机械效应和化学效应与可生成的离子反应模式之间的平衡。结果还表明,在 YAG 和蓝宝石晶体表面,离子表面反应模式比固体反应模式能更均匀地去除材料。因此,采用离子表面反应模式的 CMS 技术进行抛光时,表面质量优于固体反应。在采用离子反应的 CMS 抛光中,如果化学反应较弱,则需要在 CMS 中添加更多 Na2SiO3-5H2O 成分。这一过程将促进 -Si-OH 成分在工件表面的更多分布,从而提高反应速度,修正 CMS 抛光中机械和化学之间的平衡。这种平衡作用使 CMS-2 研磨后的 YAG 晶体表面超光滑无划痕,粗糙度达到纳米级(Ra = 1.031 nm)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of King Saud University, Engineering Sciences
Journal of King Saud University, Engineering Sciences Chemical Engineering-Fluid Flow and Transfer Processes
CiteScore
12.10
自引率
0.00%
发文量
87
审稿时长
63 days
期刊介绍: Journal of King Saud University - Engineering Sciences (JKSUES) is a peer-reviewed journal published quarterly. It is hosted and published by Elsevier B.V. on behalf of King Saud University. JKSUES is devoted to a wide range of sub-fields in the Engineering Sciences and JKSUES welcome articles of interdisciplinary nature.
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