Estimation of Write Noise Margin for 6t SRAM Cell in CMOS 45nm technology.

Hima Bindu Katikala, G.Ramana Murthy, P.RajaRajeswari, P.Sai Charan, Sd.Kashif Irfan
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Abstract

: For high speed application the static random access memory is mostly demandable. Such kind of device should possess additive parameters that can withstand during transistor scaling process. Their exist static noise margin (SNM) which degrades the device performance of memory architectures, majorly observed at write and read operation create write noise margin (WNM) and read noise margin (RNM). In this paper we discuss about the basic design of 6 transistor SRAM (6T SRAM) using 180nm and 45nm CMOS technology in Cadence Virtuoso with write noise margin analysis. The propagation delay, power dissipation, WNM are measured for both the technologies and observed that WNM is relatively low in 45nm.
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CMOS 45nm工艺下6t SRAM单元写噪声裕度估算
对于高速应用,静态随机存取存储器是最需要的。这种器件应具有在晶体管缩放过程中能够承受的附加参数。它们存在静态噪声裕度(SNM),这降低了存储器架构的性能,主要观察到在写和读操作中产生写噪声裕度(WNM)和读噪声裕度(RNM)。本文讨论了在Cadence Virtuoso中采用180nm和45nm CMOS技术的6晶体管SRAM (6T SRAM)的基本设计,并对写入噪声裕度进行了分析。测量了两种技术的传播延迟、功耗、WNM,发现45nm的WNM相对较低。
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